Wafer dicing by laser induced thermal shock process

Kai Dong Ye, Cheng Wu An, Min Hui Hong, Yong Feng Lu

Research output: Contribution to journalArticle

Abstract

In this report, a new way of wafer dicing is carried out by laser induced thermal shock process. This system consists of the use of a Nd:YAG laser to heat up the wafer surface following by a cooling fluid along the scanned line. The temperature gradient created by the laser heating and the gas cooling will cause a micro-crack on the wafer surface along the scanned line and the resulting crack propagation finally separate the silicon wafer into two pieces. As there is no material loss and removal during the separation process, the wafer dicing line width can be as small as sub-micron. The cross section of the wafer is smooth comparing with other separation methods and a high separation speed of 70 mm/s is achieved.

Original languageEnglish (US)
Pages (from-to)174-182
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4557
DOIs
StatePublished - Jan 1 2001

Fingerprint

Thermal Shock
thermal shock
Thermal shock
Wafer
wafers
Laser
Lasers
Cooling
lasers
Laser heating
Silicon wafers
Linewidth
Thermal gradients
Crack propagation
Gases
Cracks
gas cooling
Microcracks
Fluids
Nd:YAG Laser

Keywords

  • Laser cutting
  • Wafer dicing

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Wafer dicing by laser induced thermal shock process. / Ye, Kai Dong; An, Cheng Wu; Hong, Min Hui; Lu, Yong Feng.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 4557, 01.01.2001, p. 174-182.

Research output: Contribution to journalArticle

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