Vertically Integrated Silicon-on-Insulator Waveguides

R. A. Soref, E. Cortesi, F. Namavar

Research output: Contribution to journalArticle

41 Scopus citations

Abstract

A new Si02-Si-Si02-Si-Si02-Si structure produced by the SIMOX process is used for dual, vertically integrated waveguiding in silicon at X = 1.3 pm. Independent waveguiding is observed when 2-pm-thick Si cores are separated by 0.36-pm-thick Si02. Coupled waveguiding is found for an 0.12 pm intercore oxide thickness.

Original languageEnglish (US)
Pages (from-to)22-24
Number of pages3
JournalIEEE Photonics Technology Letters
Volume3
Issue number1
DOIs
Publication statusPublished - Jan 1991

    Fingerprint

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this