Vertical 3-D integration of silicon waveguides in a Si-SiO2-Si-SiO2-Si structure

Richard A. Soref, Fereydoon Namavar, Elisabetta Cortesi, Lionel Friedman, Richard Lareau

Research output: Contribution to journalConference article

5 Scopus citations

Abstract

We have built and tested new multiple-layer silicon optical waveguide structures that have applications in wafer-scale optical interconnects. A repeated sequence of oxygen implantation, annealing, and Si epitaxy was used to make 5-layer or 6-layer structures containing a pair of 2-μm-thick Si waveguide cores separated by 1200Å or 3700Å of SiO2. Coupled or uncoupled dual waveguiding at 1.3 μm was observed. Inter-guide coupling for this stacked, 3-D structure is analyzed here. Applications to all-silicon guided-wave optical interconnects are discussed.

Original languageEnglish (US)
Pages (from-to)408-421
Number of pages14
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume1389
DOIs
Publication statusPublished - Apr 1 1991
EventMicroelectronic Interconnects and Packages: Optical and Electrical Technologies 1990 - Boston, United States
Duration: Nov 4 1990Nov 9 1990

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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