Titanium boron nitride films grown by ion beam assisted deposition

Chemical and optical characterization

S. M. Aouadi, M. Debessai, Fereydoon Namavar, K. C. Wong, K. A.R. Mitchell

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Titanium boron nitride films with a functionally graded underlayer of Ti/TiN were grown at low temperatures (<200 °C) on a silicon substrate using ion beam assisted deposition. These coatings had a total thickness of 1.5 ± 0.2 μm. They were characterized using X-ray diffraction (XRD), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry. The primary phases in the film were identified using XRD and were found to be in agreement with the equilibrium phase diagram. The surface morphology and nanocrystalline nature of the coating were deduced using AFM. The chemical and phase composition was determined from XPS measurements. The refractive indices were deduced from the investigation of the ellipsometric data and were subsequently correlated to the elemental and phase composition. The hardness and elastic modulus were measured and were found to depend on phase composition. The films were implanted with carbon ions. XPS measurements revealed that new phases formed at the surface as a result of carbon implantation, namely, titanium carbide and elemental carbon. Carbon implantation significantly reduced the friction coefficient from 0.5-0.7 to 0.15-0.25. The hardness of the films decreased by 2-5%.

Original languageEnglish (US)
Pages (from-to)369-377
Number of pages9
JournalSurface and Coatings Technology
Volume183
Issue number2-3
DOIs
StatePublished - May 24 2004

Fingerprint

Ion beam assisted deposition
Boron nitride
titanium nitrides
boron nitrides
Titanium
Carbon
ion beams
Phase composition
X ray photoelectron spectroscopy
carbon
photoelectron spectroscopy
Atomic force microscopy
x rays
Hardness
implantation
X ray diffraction
Coatings
hardness
Titanium carbide
phase diagrams

Keywords

  • Ellipsometry
  • Ion beam assisted deposition
  • Nanocrystal
  • Nitride
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Titanium boron nitride films grown by ion beam assisted deposition : Chemical and optical characterization. / Aouadi, S. M.; Debessai, M.; Namavar, Fereydoon; Wong, K. C.; Mitchell, K. A.R.

In: Surface and Coatings Technology, Vol. 183, No. 2-3, 24.05.2004, p. 369-377.

Research output: Contribution to journalArticle

Aouadi, S. M. ; Debessai, M. ; Namavar, Fereydoon ; Wong, K. C. ; Mitchell, K. A.R. / Titanium boron nitride films grown by ion beam assisted deposition : Chemical and optical characterization. In: Surface and Coatings Technology. 2004 ; Vol. 183, No. 2-3. pp. 369-377.
@article{3ec23127a40d49c68b3053885583dd3e,
title = "Titanium boron nitride films grown by ion beam assisted deposition: Chemical and optical characterization",
abstract = "Titanium boron nitride films with a functionally graded underlayer of Ti/TiN were grown at low temperatures (<200 °C) on a silicon substrate using ion beam assisted deposition. These coatings had a total thickness of 1.5 ± 0.2 μm. They were characterized using X-ray diffraction (XRD), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry. The primary phases in the film were identified using XRD and were found to be in agreement with the equilibrium phase diagram. The surface morphology and nanocrystalline nature of the coating were deduced using AFM. The chemical and phase composition was determined from XPS measurements. The refractive indices were deduced from the investigation of the ellipsometric data and were subsequently correlated to the elemental and phase composition. The hardness and elastic modulus were measured and were found to depend on phase composition. The films were implanted with carbon ions. XPS measurements revealed that new phases formed at the surface as a result of carbon implantation, namely, titanium carbide and elemental carbon. Carbon implantation significantly reduced the friction coefficient from 0.5-0.7 to 0.15-0.25. The hardness of the films decreased by 2-5{\%}.",
keywords = "Ellipsometry, Ion beam assisted deposition, Nanocrystal, Nitride, X-ray photoelectron spectroscopy",
author = "Aouadi, {S. M.} and M. Debessai and Fereydoon Namavar and Wong, {K. C.} and Mitchell, {K. A.R.}",
year = "2004",
month = "5",
day = "24",
doi = "10.1016/j.surfcoat.2003.08.091",
language = "English (US)",
volume = "183",
pages = "369--377",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "2-3",

}

TY - JOUR

T1 - Titanium boron nitride films grown by ion beam assisted deposition

T2 - Chemical and optical characterization

AU - Aouadi, S. M.

AU - Debessai, M.

AU - Namavar, Fereydoon

AU - Wong, K. C.

AU - Mitchell, K. A.R.

PY - 2004/5/24

Y1 - 2004/5/24

N2 - Titanium boron nitride films with a functionally graded underlayer of Ti/TiN were grown at low temperatures (<200 °C) on a silicon substrate using ion beam assisted deposition. These coatings had a total thickness of 1.5 ± 0.2 μm. They were characterized using X-ray diffraction (XRD), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry. The primary phases in the film were identified using XRD and were found to be in agreement with the equilibrium phase diagram. The surface morphology and nanocrystalline nature of the coating were deduced using AFM. The chemical and phase composition was determined from XPS measurements. The refractive indices were deduced from the investigation of the ellipsometric data and were subsequently correlated to the elemental and phase composition. The hardness and elastic modulus were measured and were found to depend on phase composition. The films were implanted with carbon ions. XPS measurements revealed that new phases formed at the surface as a result of carbon implantation, namely, titanium carbide and elemental carbon. Carbon implantation significantly reduced the friction coefficient from 0.5-0.7 to 0.15-0.25. The hardness of the films decreased by 2-5%.

AB - Titanium boron nitride films with a functionally graded underlayer of Ti/TiN were grown at low temperatures (<200 °C) on a silicon substrate using ion beam assisted deposition. These coatings had a total thickness of 1.5 ± 0.2 μm. They were characterized using X-ray diffraction (XRD), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometry. The primary phases in the film were identified using XRD and were found to be in agreement with the equilibrium phase diagram. The surface morphology and nanocrystalline nature of the coating were deduced using AFM. The chemical and phase composition was determined from XPS measurements. The refractive indices were deduced from the investigation of the ellipsometric data and were subsequently correlated to the elemental and phase composition. The hardness and elastic modulus were measured and were found to depend on phase composition. The films were implanted with carbon ions. XPS measurements revealed that new phases formed at the surface as a result of carbon implantation, namely, titanium carbide and elemental carbon. Carbon implantation significantly reduced the friction coefficient from 0.5-0.7 to 0.15-0.25. The hardness of the films decreased by 2-5%.

KW - Ellipsometry

KW - Ion beam assisted deposition

KW - Nanocrystal

KW - Nitride

KW - X-ray photoelectron spectroscopy

UR - http://www.scopus.com/inward/record.url?scp=2442509812&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=2442509812&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2003.08.091

DO - 10.1016/j.surfcoat.2003.08.091

M3 - Article

VL - 183

SP - 369

EP - 377

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 2-3

ER -