THIN FILM COMPOSITIONAL ANALYSIS USING NULL OR FIXED WAVELENGTH ELLIPSOMETRY.

Samuel A. Alterovitz, George H. Bu-Abbud, John A Woollam, David C. Liu

Research output: Contribution to journalArticle

Abstract

The chemical composition of an insulating film on a semiconducting substrate is estimated using null or fixed wavelength ellipsometry. Multiple-wavelength-angle-of-incidence ellipsometry, together with the effective medium approximation, were used to evaluate both the composition and the geometrical structure of an insulating film made of silicon nitride and silicon oxide on a GaAs substrate. The general applicability of the technique for null or fixed wavelength ellipsometers is critically assessed and compared with the more commonly used fixed-angle-of-incidence spectroscopic ellipsometric method.

Original languageEnglish (US)
Pages (from-to)27-48
Number of pages22
JournalApplied physics communications
Volume4
Issue number1
StatePublished - Jan 1 1984

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Ellipsometry
Thin films
Wavelength
Silicon oxides
Substrates
Chemical analysis
Silicon nitride

ASJC Scopus subject areas

  • Engineering(all)

Cite this

THIN FILM COMPOSITIONAL ANALYSIS USING NULL OR FIXED WAVELENGTH ELLIPSOMETRY. / Alterovitz, Samuel A.; Bu-Abbud, George H.; Woollam, John A; Liu, David C.

In: Applied physics communications, Vol. 4, No. 1, 01.01.1984, p. 27-48.

Research output: Contribution to journalArticle

Alterovitz, Samuel A. ; Bu-Abbud, George H. ; Woollam, John A ; Liu, David C. / THIN FILM COMPOSITIONAL ANALYSIS USING NULL OR FIXED WAVELENGTH ELLIPSOMETRY. In: Applied physics communications. 1984 ; Vol. 4, No. 1. pp. 27-48.
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