The optical and surface properties of ZnO thin films by PLD

Y. F. Lu, H. Q. Ni, Z. M. Ren

Research output: Contribution to journalConference article

Abstract

ZnO films have been grown on silicon (100) and sapphire (0001) substrates by pulsed laser deposition (PLD). The influences of substrate temperature and laser fluence on the properties of the films were studied. The effects of annealing on the ZnO films were investigated by X-ray photoelectron spectroscopy (XPS). The surface properties of ZnO were studied by scanning tunneling spectroscopy (STS). The band edge emission properties of the ZnO films have been studied by the photoluminescence spectroscopy (PL).

Original languageEnglish (US)
Pages (from-to)217-220
Number of pages4
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4426
DOIs
StatePublished - Jan 1 2002
EventSecond International Symposium on Laser Precision Microfabrication - Singapore, Singapore
Duration: May 16 2001May 18 2001

Fingerprint

Pulsed Laser Deposition
Pulsed laser deposition
surface properties
pulsed laser deposition
Surface properties
Thin Films
Optical properties
optical properties
Thin films
thin films
Spectroscopy
Substrate
Photoluminescence spectroscopy
X-ray Spectroscopy
Aluminum Oxide
Sapphire
Photoluminescence
Silicon
Substrates
Annealing

Keywords

  • Annealing
  • PLD
  • STS
  • XPS
  • ZnO

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

The optical and surface properties of ZnO thin films by PLD. / Lu, Y. F.; Ni, H. Q.; Ren, Z. M.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 4426, 01.01.2002, p. 217-220.

Research output: Contribution to journalConference article

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