Temperature and thickness dependence of coercivity and magnetization of Co/Cu and Co/Si multilayers

S. Nafis, John A Woollam, Z. S. Shan, David J Sellmyer

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32 Citations (Scopus)

Abstract

Co/Cu and Co/Si multilayers of total thickness ∼3000 Å were prepared by rf and dc magnetron sputtering. The nominal thicknesses of the individual layers were in the range of 4 to 100 Å. A large coercivity (Hc) at 10 K was observed for very thin layers of Co in Co/Cu samples, and it decreased with increase of the Co layer thickness. For very thin layers of Co in Co/Cu samples, the layer behaved superparamagnetically. Similar behavior was not to be observed in Co/Si samples. With increased substrate temperature (Ts) during deposition, Hc was also observed to increase (decrease) for Co/Cu (Co/Si) samples. Magnetization data were modeled to determine the diffusion layer thicknesses.

Original languageEnglish (US)
Pages (from-to)6050-6052
Number of pages3
JournalJournal of Applied Physics
Volume70
Issue number10
DOIs
StatePublished - Dec 1 1991

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coercivity
magnetization
temperature dependence
magnetron sputtering
temperature

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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Temperature and thickness dependence of coercivity and magnetization of Co/Cu and Co/Si multilayers. / Nafis, S.; Woollam, John A; Shan, Z. S.; Sellmyer, David J.

In: Journal of Applied Physics, Vol. 70, No. 10, 01.12.1991, p. 6050-6052.

Research output: Contribution to journalArticle

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