TEM study of crystalline structures of Cr-N thin films

X. Z. Li, J. Zhang, D. J. Sellmyer

Research output: Contribution to journalArticle

5 Scopus citations

Abstract

Cr-N films were grown on Si (001) substrates by reactive magnetron sputtering under an N2/Ar atmosphere at room temperature. The composition of the films, expressed as Cr1-xNx, can be varied by changing the N2/Ar pressure ratio during the synthesis process. Crystalline states of Cr-N films have been studied using electron diffraction. It is well known that two intermediate phases, Cr2N (hexagonal) and CrN (cubic), exist in the Cr-N system, and small variations around the ideal stoichiometry are tolerated. The present study shows that cubic CrN with vacancies rather than hexagonal Cr2N may exist in a Cr-N film with a thickness of about 50 nm produced under a low N2 partial pressure.

Original languageEnglish (US)
Pages (from-to)1010-1012
Number of pages3
JournalJournal of Applied Crystallography
Volume37
Issue number6
DOIs
Publication statusPublished - Dec 1 2004

    Fingerprint

ASJC Scopus subject areas

  • Biochemistry, Genetics and Molecular Biology(all)

Cite this