Tantalum and chromium adhesion to polyimide. Part 1. BPDA-PDA surface imidization and modification

L. P. Buchwalter, Ravi F Saraf

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

BPDA-PDA (3,3’,4,4’-biphenyl dianhydride-p-phenylenediamine) tetracarboxylic acid derived polyimide (PI) surface imidization is initiated at the 230°C cure step and reaches completion at the 300°C bake. Exposure of BPDA-PDA to CF4 reactive ion etching (RIE) results in a highly fluorinated surface, as expected. Ar sputter exposure of this highly fluorinated surface causes a significant reduction in the fluorine concentration and deposition of metal from the sample pallet. Scanning electron microscopy and atomic force microscopy analyses show that CF4 RIE treatment results in significant surface roughening of the polyimide, whereas Ar sputtering smoothens the virgin and the CF4 RIE exposed polyimide.

Original languageEnglish (US)
Pages (from-to)925-940
Number of pages16
JournalJournal of Adhesion Science and Technology
Volume7
Issue number9
DOIs
StatePublished - Jan 1 1993
Externally publishedYes

Fingerprint

Tantalum
Chromium
tantalum
polyimides
Polyimides
chromium
Reactive ion etching
adhesion
Adhesion
etching
ions
Pallets
Fluorine
Sputtering
fluorine
Atomic force microscopy
sputtering
Metals
atomic force microscopy
Scanning electron microscopy

Keywords

  • Adhesion
  • Metal-polyimide
  • Polyimide
  • Surface roughness

ASJC Scopus subject areas

  • Chemistry(all)
  • Mechanics of Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Tantalum and chromium adhesion to polyimide. Part 1. BPDA-PDA surface imidization and modification. / Buchwalter, L. P.; Saraf, Ravi F.

In: Journal of Adhesion Science and Technology, Vol. 7, No. 9, 01.01.1993, p. 925-940.

Research output: Contribution to journalArticle

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