Study of surface chemical changes and erosion rates for CV-1144-O silicone under electron cyclotron resonance oxygen plasma exposure

L. Yan, X. Gao, C. Bungay, John A Woollam

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

The optical constants, the layer thicknesses and the chemical changes with atomic oxygen (AO) exposure of CV-1144-O silicone were studied using spectroscopic ellipsometry (SE). In situ SE of the erosion process under AO plasma radiation showed that the erosion rate at the beginning of the process was faster compared at the later times. About 14 nm of material was eroded away in the electron cyclotron resonace chamber within one hour. The refractive index of CV-1144-O in the visible range increased during the process which only shows that the film densified during the exposure.

Original languageEnglish (US)
Pages (from-to)447-454
Number of pages8
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume19
Issue number2
DOIs
StatePublished - Mar 1 2001

Fingerprint

Electron cyclotron resonance
Spectroscopic ellipsometry
oxygen plasma
silicones
Silicones
electron cyclotron resonance
ellipsometry
erosion
Erosion
Oxygen
Plasmas
plasma radiation
Optical constants
Cyclotrons
cyclotrons
Refractive index
chambers
refractivity
Radiation
Electrons

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

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AB - The optical constants, the layer thicknesses and the chemical changes with atomic oxygen (AO) exposure of CV-1144-O silicone were studied using spectroscopic ellipsometry (SE). In situ SE of the erosion process under AO plasma radiation showed that the erosion rate at the beginning of the process was faster compared at the later times. About 14 nm of material was eroded away in the electron cyclotron resonace chamber within one hour. The refractive index of CV-1144-O in the visible range increased during the process which only shows that the film densified during the exposure.

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