Spectroscopic ellipsometry and magneto-optic Kerr effects in Co/Pt multilayers

Xiang Gao, Darin W. Glenn, Scott Heckens, Daniel W. Thompson, John A. Woollam

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Control of thickness and microstructure is critical in the preparation of ultrathin metallic multilayers for magneto-optic memory, computer read heads, and improved wear surfaces. This paper describes use of in situ spectroscopic ellipsometry to calibrate sputter deposition rates, control layer thicknesses, determine optical constants, and study oxidation rates and processes. In this work, the information gained in situ is used together with ex situ Kerr measurements to determine the complete magneto-optic response including the spectroscopic figure of merit for Co/Pt multilayers.

Original languageEnglish (US)
Pages (from-to)4525-4531
Number of pages7
JournalJournal of Applied Physics
Volume82
Issue number9
DOIs
StatePublished - Nov 1 1997

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magneto-optics
Kerr effects
ellipsometry
memory (computers)
figure of merit
optical thickness
preparation
microstructure
oxidation

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Spectroscopic ellipsometry and magneto-optic Kerr effects in Co/Pt multilayers. / Gao, Xiang; Glenn, Darin W.; Heckens, Scott; Thompson, Daniel W.; Woollam, John A.

In: Journal of Applied Physics, Vol. 82, No. 9, 01.11.1997, p. 4525-4531.

Research output: Contribution to journalArticle

Gao, Xiang ; Glenn, Darin W. ; Heckens, Scott ; Thompson, Daniel W. ; Woollam, John A. / Spectroscopic ellipsometry and magneto-optic Kerr effects in Co/Pt multilayers. In: Journal of Applied Physics. 1997 ; Vol. 82, No. 9. pp. 4525-4531.
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