SmFe12 and SmFe12Nx films fabricated by sputtering

D. Wang, Sy-Hwang Liou, P. He, David J Sellmyer, G. C. Hadjipanayis, Y. Zhang

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Abstract

DC magnetron sputtering has been used to fabricate SmFe12 films with ThMn12 type of tetragonal structure. SmFe12Nx films were made by heating the sample in situ in a low pressure nitrogen atmosphere. The lattice parameters are a = 8.589 Å, C = 4.807 Å for SmFe12 films and a = 8.735 Å, c = 4.895 Å for SmFe12Nx films respectively, corr esponding to a volume increase of about 5.3% upon nitrogenation. A change of anisotropy and an increase of Curie temperature upon nitrogenation are observed. Aspects of crystal structure, texture and magnetic properties are reported.

Original languageEnglish (US)
Pages (from-to)62-68
Number of pages7
JournalJournal of Magnetism and Magnetic Materials
Volume124
Issue number1-2
DOIs
StatePublished - Jun 1 1993

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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