SmFe12 and SmFe12Nx films fabricated by sputtering

D. Wang, Sy-Hwang Liou, P. He, David J Sellmyer, G. C. Hadjipanayis, Y. Zhang

Research output: Contribution to journalArticle

28 Citations (Scopus)

Abstract

DC magnetron sputtering has been used to fabricate SmFe12 films with ThMn12 type of tetragonal structure. SmFe12Nx films were made by heating the sample in situ in a low pressure nitrogen atmosphere. The lattice parameters are a = 8.589 Å, C = 4.807 Å for SmFe12 films and a = 8.735 Å, c = 4.895 Å for SmFe12Nx films respectively, corr esponding to a volume increase of about 5.3% upon nitrogenation. A change of anisotropy and an increase of Curie temperature upon nitrogenation are observed. Aspects of crystal structure, texture and magnetic properties are reported.

Original languageEnglish (US)
Pages (from-to)62-68
Number of pages7
JournalJournal of Magnetism and Magnetic Materials
Volume124
Issue number1-2
DOIs
StatePublished - Jun 1 1993

Fingerprint

Sputtering
sputtering
nitrogenation
Curie temperature
Magnetron sputtering
Lattice constants
lattice parameters
Magnetic properties
magnetron sputtering
Anisotropy
Nitrogen
textures
low pressure
Textures
Crystal structure
direct current
magnetic properties
Heating
nitrogen
atmospheres

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

SmFe12 and SmFe12Nx films fabricated by sputtering. / Wang, D.; Liou, Sy-Hwang; He, P.; Sellmyer, David J; Hadjipanayis, G. C.; Zhang, Y.

In: Journal of Magnetism and Magnetic Materials, Vol. 124, No. 1-2, 01.06.1993, p. 62-68.

Research output: Contribution to journalArticle

Wang, D. ; Liou, Sy-Hwang ; He, P. ; Sellmyer, David J ; Hadjipanayis, G. C. ; Zhang, Y. / SmFe12 and SmFe12Nx films fabricated by sputtering. In: Journal of Magnetism and Magnetic Materials. 1993 ; Vol. 124, No. 1-2. pp. 62-68.
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