Simulation of the growth of CVD films

Jacob J. Thiart, Vladimir Hlavacek, Hendrik J Viljoen

Research output: Contribution to journalArticle

6 Citations (Scopus)
Original languageEnglish (US)
Pages (from-to)3493-3497
Number of pages5
JournalChemical Engineering Science
Volume50
Issue number21
DOIs
StatePublished - Jan 1 1995

Fingerprint

High pressure effects
Approximation theory
Chemical Reactors
Chemical reactors
Diffusion in gases
Chemical Vapor Deposition
Thermal Effects
Approximation Theory
Finite difference method
Thermal effects
Partial differential equations
Chemical vapor deposition
Computer Simulation
Partial differential equation
Finite Element Method
Boundary conditions
Finite element method
Computer simulation
Simulation

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Industrial and Manufacturing Engineering

Cite this

Simulation of the growth of CVD films. / Thiart, Jacob J.; Hlavacek, Vladimir; Viljoen, Hendrik J.

In: Chemical Engineering Science, Vol. 50, No. 21, 01.01.1995, p. 3493-3497.

Research output: Contribution to journalArticle

Thiart, Jacob J. ; Hlavacek, Vladimir ; Viljoen, Hendrik J. / Simulation of the growth of CVD films. In: Chemical Engineering Science. 1995 ; Vol. 50, No. 21. pp. 3493-3497.
@article{89623418fdeb468da4a529cb0c85020f,
title = "Simulation of the growth of CVD films",
author = "Thiart, {Jacob J.} and Vladimir Hlavacek and Viljoen, {Hendrik J}",
year = "1995",
month = "1",
day = "1",
doi = "10.1016/0009-2509(95)00201-F",
language = "English (US)",
volume = "50",
pages = "3493--3497",
journal = "Chemical Engineering Science",
issn = "0009-2509",
publisher = "Elsevier BV",
number = "21",

}

TY - JOUR

T1 - Simulation of the growth of CVD films

AU - Thiart, Jacob J.

AU - Hlavacek, Vladimir

AU - Viljoen, Hendrik J

PY - 1995/1/1

Y1 - 1995/1/1

UR - http://www.scopus.com/inward/record.url?scp=0029408533&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0029408533&partnerID=8YFLogxK

U2 - 10.1016/0009-2509(95)00201-F

DO - 10.1016/0009-2509(95)00201-F

M3 - Article

VL - 50

SP - 3493

EP - 3497

JO - Chemical Engineering Science

JF - Chemical Engineering Science

SN - 0009-2509

IS - 21

ER -