Selective assembly of nanoparticles on block copolymer by surface modification

Sanjun Niu, Ravi F Saraf

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

We have developed a method to selectively deposit nanoparticles on the ordered nanoscale elements of PS-PI-PS (polystyrene-polyisoprene-polystyrene) block copolymer film. The process utilizes reactive ion plasma to selectively modify the PS surface with amine groups to electrostatically attract negatively charged Au nanoparticles. In spite of the strong interparticle Coulombic repulsion, the deposition on PS domains is significantly high. It is observed that the deposition at the edges of the domain is particularly high, forming a percolating nanoparticle necklace. The latter may lead to interesting avenues to fabricate electronic devices.

Original languageEnglish (US)
Article number125607
JournalNanotechnology
Volume18
Issue number12
DOIs
StatePublished - Mar 28 2007

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Block copolymers
Surface treatment
Nanoparticles
Polystyrenes
Polyisoprenes
Amines
Deposits
Ions
Plasmas

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Selective assembly of nanoparticles on block copolymer by surface modification. / Niu, Sanjun; Saraf, Ravi F.

In: Nanotechnology, Vol. 18, No. 12, 125607, 28.03.2007.

Research output: Contribution to journalArticle

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