Selective area laser induced deposition of metal boride thin films

Z. C. Zhong, V. Holmes, P. A. Dowben, D. J. Sellmyer

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

We have developed a novel technique for the selective area deposition of rare earth hexaborides: laser-induced solution deposition (LISD). This technique is both simple and efficient and combines many advantages of both chemical vapor deposition and electrolytic deposition. The results of LISD deposition show that the polycrystalline thin films of rare earth hexaborides and sub-borides such as MB6, MB4, and MB2 (M = Gd, La) are formed through the light initiated chemical reaction of nido-decaborane (B10H14) and rare earth chloride in solution. These films grow with a strong texture growth axis and morphology that is dependent both on the selection of solvents and laser wavelengths and power used in LISD.

Original languageEnglish (US)
Pages (from-to)91-96
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume558
StatePublished - Jan 1 2000

Fingerprint

Boron Compounds
borides
Borides
Metals
Thin films
Lasers
Rare earths
thin films
metals
lasers
rare earth elements
Electrodeposition
Chlorides
Chemical reactions
Chemical vapor deposition
Textures
chemical reactions
textures
Wavelength
chlorides

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Selective area laser induced deposition of metal boride thin films. / Zhong, Z. C.; Holmes, V.; Dowben, P. A.; Sellmyer, D. J.

In: Materials Research Society Symposium - Proceedings, Vol. 558, 01.01.2000, p. 91-96.

Research output: Contribution to journalArticle

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