Recrystallization behavior in chiral sculptured thin films from silicon

E. Schubert, J. Fahlteich, B. Rauschenbach, M. Schubert, M. Lorenz, M. Grundmann, G. Wagner

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Chiral sculptured thin films, which contain amorphous silicon screws with a fiberlike fine structure, were grown by ion-beam-assisted glancing-angle deposition at room temperature. The thin films were postgrowth annealed in the temperature range from 400 to 1000°C. Raman spectroscopy and transmission electron microscopy investigations performed before and after sample annealing reveal a recrystallization of silicon at temperatures above 800°C, with a persistence of the chiral structure geometry and fine structure. The Raman results are further discussed in terms of quantum confinement and coexisting phase effects.

Original languageEnglish (US)
Article number016107
JournalJournal of Applied Physics
Volume100
Issue number1
DOIs
StatePublished - Jul 28 2006

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fine structure
silicon
screws
thin films
amorphous silicon
Raman spectroscopy
ion beams
transmission electron microscopy
annealing
temperature
room temperature
geometry

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Schubert, E., Fahlteich, J., Rauschenbach, B., Schubert, M., Lorenz, M., Grundmann, M., & Wagner, G. (2006). Recrystallization behavior in chiral sculptured thin films from silicon. Journal of Applied Physics, 100(1), [016107]. https://doi.org/10.1063/1.2207728

Recrystallization behavior in chiral sculptured thin films from silicon. / Schubert, E.; Fahlteich, J.; Rauschenbach, B.; Schubert, M.; Lorenz, M.; Grundmann, M.; Wagner, G.

In: Journal of Applied Physics, Vol. 100, No. 1, 016107, 28.07.2006.

Research output: Contribution to journalArticle

Schubert, E, Fahlteich, J, Rauschenbach, B, Schubert, M, Lorenz, M, Grundmann, M & Wagner, G 2006, 'Recrystallization behavior in chiral sculptured thin films from silicon', Journal of Applied Physics, vol. 100, no. 1, 016107. https://doi.org/10.1063/1.2207728
Schubert E, Fahlteich J, Rauschenbach B, Schubert M, Lorenz M, Grundmann M et al. Recrystallization behavior in chiral sculptured thin films from silicon. Journal of Applied Physics. 2006 Jul 28;100(1). 016107. https://doi.org/10.1063/1.2207728
Schubert, E. ; Fahlteich, J. ; Rauschenbach, B. ; Schubert, M. ; Lorenz, M. ; Grundmann, M. ; Wagner, G. / Recrystallization behavior in chiral sculptured thin films from silicon. In: Journal of Applied Physics. 2006 ; Vol. 100, No. 1.
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