Recent developments in spectroscopic ellipsometry for in situ applications

Blaine Johs, Jeff Hale, N. J. Ianno, Craig M. Herzinger, Tom Tiwald, John A. Woollam

Research output: Contribution to journalArticle

38 Citations (Scopus)

Abstract

The in situ measurement capabilities and advantages of recently developed spectroscopic ellipsometry (SE) instrumentation, which covers wide spectral ranges (190 - 1700nm, or 0.73 - 6.5 eV) and is based on rotating-compensator technology, are described. A technique which can quantitatively correct for window birefringence is presented. Current in situ SE deposition monitoring and control applications in the compound semiconductor, display, and optical coatings industries are also presented.

Original languageEnglish (US)
Pages (from-to)41-57
Number of pages17
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4449
DOIs
StatePublished - Jan 1 2001

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Spectroscopic Ellipsometry
Spectroscopic ellipsometry
ellipsometry
Optical Coatings
Optical coatings
coatings
In Situ Measurements
optical coatings
Birefringence
compensators
Compensator
in situ measurement
Instrumentation
birefringence
Semiconductors
Display
Rotating
industries
Display devices
Cover

Keywords

  • Ellipsometry
  • In situ
  • Process control
  • Real-time
  • Spectroscopy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Recent developments in spectroscopic ellipsometry for in situ applications. / Johs, Blaine; Hale, Jeff; Ianno, N. J.; Herzinger, Craig M.; Tiwald, Tom; Woollam, John A.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 4449, 01.01.2001, p. 41-57.

Research output: Contribution to journalArticle

Johs, Blaine ; Hale, Jeff ; Ianno, N. J. ; Herzinger, Craig M. ; Tiwald, Tom ; Woollam, John A. / Recent developments in spectroscopic ellipsometry for in situ applications. In: Proceedings of SPIE - The International Society for Optical Engineering. 2001 ; Vol. 4449. pp. 41-57.
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