Oxygen plasma effects on optical properties of ZnSe films

Li Yan, John A Woollam, Eva Franke

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

The Herzinger-Johs model was used to obtain excellent fits over the entire spectral range available, starting from the VUV up to the middle IR. Six critical points were observed. Drastic changes were detected upon oxygen plasma irradiation in the VUV-UV-VIS-NIR region, while few were seen in the middle IR. Theoretical infrared electrochromic device performance was evaluated based on previous experimental device results, along with optical data obtained from the experiments.

Original languageEnglish (US)
Pages (from-to)693-701
Number of pages9
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume20
Issue number3
DOIs
StatePublished - May 1 2002

Fingerprint

Electrochromic devices
oxygen plasma
Optical properties
Irradiation
Oxygen
Infrared radiation
Plasmas
optical properties
critical point
Experiments
irradiation

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Oxygen plasma effects on optical properties of ZnSe films. / Yan, Li; Woollam, John A; Franke, Eva.

In: Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films, Vol. 20, No. 3, 01.05.2002, p. 693-701.

Research output: Contribution to journalArticle

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