Optical modeling of Iridium thin film erosion under oxygen plasma exposure

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3 Scopus citations


The use of ellipsometry and spectroscopic mode to monitor oxygen plasma etching of iridium was analyzed. It was observed that the etching of film of iridium was done on fused silica substrates using an electron cyclotron resonance plasma source. The nanoscale atomic mixing and index of refraction grading were also analyzed. It was found that the iridium films were etched upon plasma irradiation using spectroscopic psi and delta data.

Original languageEnglish (US)
Pages (from-to)2177-2181
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number5
Publication statusPublished - Sep 1 2004


ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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