Optical constants and roughness study of dc magnetron sputtered iridium films

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24 Citations (Scopus)

Abstract

Extremely smooth thin films of iridium have been deposited onto superpolished fused silica substrates using dc magnetron sputtering in an argon plasma. The influence of deposition process parameters on film microroughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometry, over the spectral range from vacuum ultraviolet to middle infrared (140 nm-35 μm). Because the Ir films were optically thick and the surface roughnesses were measured by atomic force microscopy then accounted for in the optical model, the as-determined film optical constants are expected to be the best available for Ir bulk metals, minimally affected by surface overlayers or microstructure.

Original languageEnglish (US)
Pages (from-to)4386-4392
Number of pages7
JournalJournal of Applied Physics
Volume92
Issue number8
DOIs
StatePublished - Oct 15 2002

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iridium
roughness
argon plasma
ellipsometry
magnetron sputtering
surface roughness
atomic force microscopy
silicon dioxide
vacuum
microstructure
thin films
metals

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Optical constants and roughness study of dc magnetron sputtered iridium films. / Yan, Li; Woollam, John A.

In: Journal of Applied Physics, Vol. 92, No. 8, 15.10.2002, p. 4386-4392.

Research output: Contribution to journalArticle

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