NSF-EC workshop on nanomanufacturing and processing: A summary report

Ranga Komanduri, Julie Chen, Ajay P. Malshe, Charalabos C. Doumanidis, K. P. Rajurkar

Research output: Contribution to journalConference article

2 Citations (Scopus)

Abstract

A report on NSF-EC workshop on nanomanufacturing and processing which was held in San Juan, Puerto Rico on 5-7 January 2002 was presented. It was envisioned that the NSF-EC cooperation will provide a critical thrust to translate the growing global investments in the field of nanoscale science and engineering into new scientific developments and engineering applications. One of the objectives of the workshop was to identify a support plan for the infrastructure required to achieve the research/education objectives.

Original languageEnglish (US)
Pages (from-to)446-454
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4936
DOIs
StatePublished - Dec 1 2002
EventNano- and Microtechnology: Materials, Processes, Packaging, and Systems - Melbourne, VIC., Australia
Duration: Dec 16 2002Dec 18 2002

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Nanomanufacturing
Engineering Application
Infrastructure
engineering
Puerto Rico
Engineering
Processing
thrust
education
Education

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

NSF-EC workshop on nanomanufacturing and processing : A summary report. / Komanduri, Ranga; Chen, Julie; Malshe, Ajay P.; Doumanidis, Charalabos C.; Rajurkar, K. P.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 4936, 01.12.2002, p. 446-454.

Research output: Contribution to journalConference article

Komanduri, Ranga ; Chen, Julie ; Malshe, Ajay P. ; Doumanidis, Charalabos C. ; Rajurkar, K. P. / NSF-EC workshop on nanomanufacturing and processing : A summary report. In: Proceedings of SPIE - The International Society for Optical Engineering. 2002 ; Vol. 4936. pp. 446-454.
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