Nanoscale material redistribution induced by spatially modulated femtosecond laser pulses for flexible high-efficiency surface patterning

Andong Wang, Lan Jiang, Xiaowei Li, Zhijie Xu, Lingling Huang, Kaihu Zhang, Xu Ji, Yongfeng Lu

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

In this paper, we investigated the material redistribution phenomenon controlled by spatially modulated femtosecond laser pulses on a silicon surface. The intensity distribution was shaped by using a spatial light modulator. The material was first selectively melted and then redistributed by the laser-induced plasma. Thus, complex surface patterns were formed conformal to the laser intensity distribution. Sub-diffraction-limit size can be achieved due to the nanoscale material redistribution. Only one pulse was needed in the surface patterning process, thus greatly favoring the efficiency improvement. Combined with multibeam interference, a large-scale nanostructure array can be fabricated with high efficiency of 1600 μm 2 /pulse. This method offers a simple, flexible and efficient alternative approach for nanoscale surface patterning applications.

Original languageEnglish (US)
Pages (from-to)31431-31442
Number of pages12
JournalOptics Express
Volume25
Issue number25
DOIs
StatePublished - Dec 11 2017

Fingerprint

pulses
lasers
light modulators
interference
silicon
diffraction

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Nanoscale material redistribution induced by spatially modulated femtosecond laser pulses for flexible high-efficiency surface patterning. / Wang, Andong; Jiang, Lan; Li, Xiaowei; Xu, Zhijie; Huang, Lingling; Zhang, Kaihu; Ji, Xu; Lu, Yongfeng.

In: Optics Express, Vol. 25, No. 25, 11.12.2017, p. 31431-31442.

Research output: Contribution to journalArticle

Wang, Andong ; Jiang, Lan ; Li, Xiaowei ; Xu, Zhijie ; Huang, Lingling ; Zhang, Kaihu ; Ji, Xu ; Lu, Yongfeng. / Nanoscale material redistribution induced by spatially modulated femtosecond laser pulses for flexible high-efficiency surface patterning. In: Optics Express. 2017 ; Vol. 25, No. 25. pp. 31431-31442.
@article{2c7437eeb84d482a9dfd8960fe2f5184,
title = "Nanoscale material redistribution induced by spatially modulated femtosecond laser pulses for flexible high-efficiency surface patterning",
abstract = "In this paper, we investigated the material redistribution phenomenon controlled by spatially modulated femtosecond laser pulses on a silicon surface. The intensity distribution was shaped by using a spatial light modulator. The material was first selectively melted and then redistributed by the laser-induced plasma. Thus, complex surface patterns were formed conformal to the laser intensity distribution. Sub-diffraction-limit size can be achieved due to the nanoscale material redistribution. Only one pulse was needed in the surface patterning process, thus greatly favoring the efficiency improvement. Combined with multibeam interference, a large-scale nanostructure array can be fabricated with high efficiency of 1600 μm 2 /pulse. This method offers a simple, flexible and efficient alternative approach for nanoscale surface patterning applications.",
author = "Andong Wang and Lan Jiang and Xiaowei Li and Zhijie Xu and Lingling Huang and Kaihu Zhang and Xu Ji and Yongfeng Lu",
year = "2017",
month = "12",
day = "11",
doi = "10.1364/OE.25.031431",
language = "English (US)",
volume = "25",
pages = "31431--31442",
journal = "Optics Express",
issn = "1094-4087",
publisher = "The Optical Society",
number = "25",

}

TY - JOUR

T1 - Nanoscale material redistribution induced by spatially modulated femtosecond laser pulses for flexible high-efficiency surface patterning

AU - Wang, Andong

AU - Jiang, Lan

AU - Li, Xiaowei

AU - Xu, Zhijie

AU - Huang, Lingling

AU - Zhang, Kaihu

AU - Ji, Xu

AU - Lu, Yongfeng

PY - 2017/12/11

Y1 - 2017/12/11

N2 - In this paper, we investigated the material redistribution phenomenon controlled by spatially modulated femtosecond laser pulses on a silicon surface. The intensity distribution was shaped by using a spatial light modulator. The material was first selectively melted and then redistributed by the laser-induced plasma. Thus, complex surface patterns were formed conformal to the laser intensity distribution. Sub-diffraction-limit size can be achieved due to the nanoscale material redistribution. Only one pulse was needed in the surface patterning process, thus greatly favoring the efficiency improvement. Combined with multibeam interference, a large-scale nanostructure array can be fabricated with high efficiency of 1600 μm 2 /pulse. This method offers a simple, flexible and efficient alternative approach for nanoscale surface patterning applications.

AB - In this paper, we investigated the material redistribution phenomenon controlled by spatially modulated femtosecond laser pulses on a silicon surface. The intensity distribution was shaped by using a spatial light modulator. The material was first selectively melted and then redistributed by the laser-induced plasma. Thus, complex surface patterns were formed conformal to the laser intensity distribution. Sub-diffraction-limit size can be achieved due to the nanoscale material redistribution. Only one pulse was needed in the surface patterning process, thus greatly favoring the efficiency improvement. Combined with multibeam interference, a large-scale nanostructure array can be fabricated with high efficiency of 1600 μm 2 /pulse. This method offers a simple, flexible and efficient alternative approach for nanoscale surface patterning applications.

UR - http://www.scopus.com/inward/record.url?scp=85038214233&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85038214233&partnerID=8YFLogxK

U2 - 10.1364/OE.25.031431

DO - 10.1364/OE.25.031431

M3 - Article

VL - 25

SP - 31431

EP - 31442

JO - Optics Express

JF - Optics Express

SN - 1094-4087

IS - 25

ER -