Multiple-layered effective medium approximation approach to modeling environmental effects on alumina passivated highly porous silicon nanostructured thin films measured by in-situ Mueller matrix ellipsometry

Alyssa Mock, Timothy Carlson, Jeremy VanDerslice, Joel Mohrmann, John A. Woollam, Eva Schubert, Mathias Schubert

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Optical changes in alumina passivated highly porous silicon slanted columnar thin films during controlled exposure to toluene vapor are reported. Electron-beam evaporation glancing angle deposition and subsequent atomic layer deposition are utilized to deposit alumina passivated nanostructured porous silicon thin films. In-situ Mueller matrix generalized spectroscopic ellipsometry in an environmental cell is then used to determine changes in optical properties of the nanostructured thin films by inspection of individual Mueller matrix elements, each of which exhibit sensitivity to adsorption. The use of a multiple-layered effective medium approximation model allows for accurate description of the inhomogeneous nature of toluene adsorption onto alumina passivated highly porous silicon slanted columnar thin films.

Original languageEnglish (US)
Pages (from-to)663-666
Number of pages4
JournalApplied Surface Science
Volume421
DOIs
StatePublished - Nov 1 2017

Fingerprint

Aluminum Oxide
Porous silicon
Ellipsometry
Environmental impact
Alumina
Thin films
Toluene
Adsorption
Spectroscopic ellipsometry
Atomic layer deposition
Electron beams
Evaporation
Deposits
Optical properties
Inspection
Vapors

Keywords

  • Adsorption
  • Ellipsometry
  • In-situ
  • Mueller matrix
  • Porous silicon

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

@article{e7739e69439140eaacacf7f2ee83371b,
title = "Multiple-layered effective medium approximation approach to modeling environmental effects on alumina passivated highly porous silicon nanostructured thin films measured by in-situ Mueller matrix ellipsometry",
abstract = "Optical changes in alumina passivated highly porous silicon slanted columnar thin films during controlled exposure to toluene vapor are reported. Electron-beam evaporation glancing angle deposition and subsequent atomic layer deposition are utilized to deposit alumina passivated nanostructured porous silicon thin films. In-situ Mueller matrix generalized spectroscopic ellipsometry in an environmental cell is then used to determine changes in optical properties of the nanostructured thin films by inspection of individual Mueller matrix elements, each of which exhibit sensitivity to adsorption. The use of a multiple-layered effective medium approximation model allows for accurate description of the inhomogeneous nature of toluene adsorption onto alumina passivated highly porous silicon slanted columnar thin films.",
keywords = "Adsorption, Ellipsometry, In-situ, Mueller matrix, Porous silicon",
author = "Alyssa Mock and Timothy Carlson and Jeremy VanDerslice and Joel Mohrmann and Woollam, {John A.} and Eva Schubert and Mathias Schubert",
year = "2017",
month = "11",
day = "1",
doi = "10.1016/j.apsusc.2016.10.004",
language = "English (US)",
volume = "421",
pages = "663--666",
journal = "Applied Surface Science",
issn = "0169-4332",
publisher = "Elsevier",

}

TY - JOUR

T1 - Multiple-layered effective medium approximation approach to modeling environmental effects on alumina passivated highly porous silicon nanostructured thin films measured by in-situ Mueller matrix ellipsometry

AU - Mock, Alyssa

AU - Carlson, Timothy

AU - VanDerslice, Jeremy

AU - Mohrmann, Joel

AU - Woollam, John A.

AU - Schubert, Eva

AU - Schubert, Mathias

PY - 2017/11/1

Y1 - 2017/11/1

N2 - Optical changes in alumina passivated highly porous silicon slanted columnar thin films during controlled exposure to toluene vapor are reported. Electron-beam evaporation glancing angle deposition and subsequent atomic layer deposition are utilized to deposit alumina passivated nanostructured porous silicon thin films. In-situ Mueller matrix generalized spectroscopic ellipsometry in an environmental cell is then used to determine changes in optical properties of the nanostructured thin films by inspection of individual Mueller matrix elements, each of which exhibit sensitivity to adsorption. The use of a multiple-layered effective medium approximation model allows for accurate description of the inhomogeneous nature of toluene adsorption onto alumina passivated highly porous silicon slanted columnar thin films.

AB - Optical changes in alumina passivated highly porous silicon slanted columnar thin films during controlled exposure to toluene vapor are reported. Electron-beam evaporation glancing angle deposition and subsequent atomic layer deposition are utilized to deposit alumina passivated nanostructured porous silicon thin films. In-situ Mueller matrix generalized spectroscopic ellipsometry in an environmental cell is then used to determine changes in optical properties of the nanostructured thin films by inspection of individual Mueller matrix elements, each of which exhibit sensitivity to adsorption. The use of a multiple-layered effective medium approximation model allows for accurate description of the inhomogeneous nature of toluene adsorption onto alumina passivated highly porous silicon slanted columnar thin films.

KW - Adsorption

KW - Ellipsometry

KW - In-situ

KW - Mueller matrix

KW - Porous silicon

UR - http://www.scopus.com/inward/record.url?scp=85005788059&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85005788059&partnerID=8YFLogxK

U2 - 10.1016/j.apsusc.2016.10.004

DO - 10.1016/j.apsusc.2016.10.004

M3 - Article

AN - SCOPUS:85005788059

VL - 421

SP - 663

EP - 666

JO - Applied Surface Science

JF - Applied Surface Science

SN - 0169-4332

ER -