Magnetic domain patterns of rectangular and elliptic arrays of small permalloy elements

Sy-Hwang Liou, Renat F Sabirianov, S. S. Jaswal, J. C. Wu, Y. D. Yao

Research output: Contribution to journalArticle

24 Citations (Scopus)

Abstract

Magnetic domain patterns of two series of soft magnetic arrays are studied as functions of the aspect ratios. The magnetic images are obtained by using MFM with low magnetic stray field and high-coercivity MFM tips. A 30 nm thick layer of Ni80Fe20 alloy is prepared by thermal evaporation and electron beam lithography and lift-off patterning technique on a silicon substrate. The effect of the edge roughness and initial conditions on the magnetic domain patterns is compared with the results obtained by micromagnetic simulations. This comparison clearly shows that the domain structure is related to the edge roughness.

Original languageEnglish (US)
Pages (from-to)1270-1272
Number of pages3
JournalJournal of Magnetism and Magnetic Materials
Volume226-230
Issue numberPART II
DOIs
StatePublished - Jan 1 2001

Fingerprint

Magnetic domains
magnetic force microscopy
Permalloys (trademark)
magnetic domains
roughness
Surface roughness
Thermal evaporation
Electron beam lithography
Silicon
Coercive force
coercivity
aspect ratio
Aspect ratio
lithography
evaporation
electron beams
silicon
Substrates
magnetic fields
simulation

Keywords

  • Domain structure
  • Magnetic force microscopy
  • Micromagnetic calculation
  • Permalloy

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Magnetic domain patterns of rectangular and elliptic arrays of small permalloy elements. / Liou, Sy-Hwang; Sabirianov, Renat F; Jaswal, S. S.; Wu, J. C.; Yao, Y. D.

In: Journal of Magnetism and Magnetic Materials, Vol. 226-230, No. PART II, 01.01.2001, p. 1270-1272.

Research output: Contribution to journalArticle

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