Low temperature normal state resistance of ternary molybdenum sulfides

J. A. Woollam, S. A. Alterovitz

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

The resistance varies as T2 over the range of T from Tc to nearly 40 K, in sintered, sputtered and evaporated thin film CuxMo6S8, and in sputtered PbMo6S8 films. In sintered PbMo6S8 the resistance varies as T. These results can neither be explained by existing theory for PbMo6S8, nor by a Mo2S3 phase argument.

Original languageEnglish (US)
Pages (from-to)571-574
Number of pages4
JournalSolid State Communications
Volume27
Issue number5
DOIs
StatePublished - Aug 1978

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molybdenum sulfides
Molybdenum
Thin films
Temperature
thin films
Sulfides
molybdenum disulfide

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

Cite this

Low temperature normal state resistance of ternary molybdenum sulfides. / Woollam, J. A.; Alterovitz, S. A.

In: Solid State Communications, Vol. 27, No. 5, 08.1978, p. 571-574.

Research output: Contribution to journalArticle

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