Low-temperature characterization of the magnetic properties of MnBiAl thin films

K. W. Wierman, J. X. Shen, R. D. Kirby, David J Sellmyer

Research output: Contribution to journalArticle

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Abstract

The magnetic properties of thin-film samples of MnBi0.8Al x with aluminum concentrations of x=0.0, 0.4, 0.6, and 0.8 were systematically studied over a temperature range of 20 to 300 K. The as-deposited films are amorphous and nonmagnetic, but highly textured polycrystalline films that are ferromagnetic are formed by annealing at 350°C. Our measurements show that the coercivity of such films rapidly decreases, then approaches a constant value (4 kOe for x=0.4) with increasing annealing time. Magnetic measurements show that both anisotropy and coercivity decrease with decreasing temperature. Unlike bulk MnBi, our MnBi0.8Alx thin films do not have a spin reorientation transition at low temperatures. This may be due to impediment of the lattice contraction by the Al atoms doped into the interstitial sites of the MnBi lattice.

Original languageEnglish (US)
Pages (from-to)6348-6350
Number of pages3
JournalJournal of Applied Physics
Volume75
Issue number10
DOIs
StatePublished - Dec 1 1994

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magnetic properties
coercivity
thin films
annealing
retraining
contraction
magnetic measurement
interstitials
aluminum
anisotropy
temperature
atoms

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Low-temperature characterization of the magnetic properties of MnBiAl thin films. / Wierman, K. W.; Shen, J. X.; Kirby, R. D.; Sellmyer, David J.

In: Journal of Applied Physics, Vol. 75, No. 10, 01.12.1994, p. 6348-6350.

Research output: Contribution to journalArticle

Wierman, K. W. ; Shen, J. X. ; Kirby, R. D. ; Sellmyer, David J. / Low-temperature characterization of the magnetic properties of MnBiAl thin films. In: Journal of Applied Physics. 1994 ; Vol. 75, No. 10. pp. 6348-6350.
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