Low-Loss Planar Optical Waveguides Fabricated in SIMOX Material

A. Rickman, G. T. Reed, B. L. Weiss, F. Namavar

Research output: Contribution to journalArticle

73 Citations (Scopus)

Abstract

Planar optical waveguides have been formed in SIMOX structures, and the effect of the thickness of the buried oxide layer on propagation loss has been studied. Waveguides with guiding layer thickness of approximately 6 μm, have been measured, and a lowest loss, which is of the order of that of pure silicon, was observed for a buried oxide thickness of 0.4 μm, at a measurement wavelength of 1.523 μm,.

Original languageEnglish (US)
Pages (from-to)633-635
Number of pages3
JournalIEEE Photonics Technology Letters
Volume4
Issue number6
DOIs
StatePublished - Jun 1992

Fingerprint

Planar waveguides
Optical waveguides
optical waveguides
Oxides
Silicon
Waveguides
oxides
Wavelength
waveguides
propagation
silicon
wavelengths

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this

Low-Loss Planar Optical Waveguides Fabricated in SIMOX Material. / Rickman, A.; Reed, G. T.; Weiss, B. L.; Namavar, F.

In: IEEE Photonics Technology Letters, Vol. 4, No. 6, 06.1992, p. 633-635.

Research output: Contribution to journalArticle

Rickman, A. ; Reed, G. T. ; Weiss, B. L. ; Namavar, F. / Low-Loss Planar Optical Waveguides Fabricated in SIMOX Material. In: IEEE Photonics Technology Letters. 1992 ; Vol. 4, No. 6. pp. 633-635.
@article{b9957a587db149218a622278d80210da,
title = "Low-Loss Planar Optical Waveguides Fabricated in SIMOX Material",
abstract = "Planar optical waveguides have been formed in SIMOX structures, and the effect of the thickness of the buried oxide layer on propagation loss has been studied. Waveguides with guiding layer thickness of approximately 6 μm, have been measured, and a lowest loss, which is of the order of that of pure silicon, was observed for a buried oxide thickness of 0.4 μm, at a measurement wavelength of 1.523 μm,.",
author = "A. Rickman and Reed, {G. T.} and Weiss, {B. L.} and F. Namavar",
year = "1992",
month = "6",
doi = "10.1109/68.141992",
language = "English (US)",
volume = "4",
pages = "633--635",
journal = "IEEE Photonics Technology Letters",
issn = "1041-1135",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "6",

}

TY - JOUR

T1 - Low-Loss Planar Optical Waveguides Fabricated in SIMOX Material

AU - Rickman, A.

AU - Reed, G. T.

AU - Weiss, B. L.

AU - Namavar, F.

PY - 1992/6

Y1 - 1992/6

N2 - Planar optical waveguides have been formed in SIMOX structures, and the effect of the thickness of the buried oxide layer on propagation loss has been studied. Waveguides with guiding layer thickness of approximately 6 μm, have been measured, and a lowest loss, which is of the order of that of pure silicon, was observed for a buried oxide thickness of 0.4 μm, at a measurement wavelength of 1.523 μm,.

AB - Planar optical waveguides have been formed in SIMOX structures, and the effect of the thickness of the buried oxide layer on propagation loss has been studied. Waveguides with guiding layer thickness of approximately 6 μm, have been measured, and a lowest loss, which is of the order of that of pure silicon, was observed for a buried oxide thickness of 0.4 μm, at a measurement wavelength of 1.523 μm,.

UR - http://www.scopus.com/inward/record.url?scp=0026883754&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0026883754&partnerID=8YFLogxK

U2 - 10.1109/68.141992

DO - 10.1109/68.141992

M3 - Article

AN - SCOPUS:0026883754

VL - 4

SP - 633

EP - 635

JO - IEEE Photonics Technology Letters

JF - IEEE Photonics Technology Letters

SN - 1041-1135

IS - 6

ER -