Laser assisted nanofabrication

M. H. Hong, S. M. Huang, B. S. Luk'yanchuk, Z. B. Wang, Y. F. Lu, T. C. Chong

Research output: Contribution to journalConference article

4 Scopus citations


Laser assisted nanofabrication for surface nanopatterning is investigated. To overcome the limitation of light wavelength, pulsed lasers were applied to combine with atomic force microscope (AFM) and nanoparticle self-assembled mask to achieve sub-30 nm patterning on the metallic surfaces. The mechanisms of the formation of nanostructure patterns are discussed. Progress on numerical simulation and physical modeling of laser assisted nanofabrication has been demonstrated. The method of AFM tip or particle enhanced laser irradiation allows the study of field enhancement effects as well as its potential applications for nanolithography.

Original languageEnglish (US)
Pages (from-to)142-155
Number of pages14
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - Dec 5 2003
EventPROCEEDINGS OF SPIE SPIE - The International Society for Optical Engineering: Photon Processing in Microelectronics and Photonics II - San Jose, CA, United States
Duration: Jan 27 2003Jan 30 2003



  • Laser irradiation
  • Mie scattering
  • Nanostructuring
  • Near field

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Hong, M. H., Huang, S. M., Luk'yanchuk, B. S., Wang, Z. B., Lu, Y. F., & Chong, T. C. (2003). Laser assisted nanofabrication. Proceedings of SPIE - The International Society for Optical Engineering, 4977, 142-155.