Ion-source-assisted pulsed laser deposition of carbon nitride thin films

Z. F. He, Yongfeng Lu, Z. H. Mai, Z. M. Ren

Research output: Contribution to journalConference article

Abstract

Ion source assisted pulsed laser deposition has been used to synthesize carbon nitride thin films. This synthesis method has both advantages of pulsed laser deposition (PLD) and ion implantation. The average ion beam current, the beam voltage, the laser pulse energy, and substrate temperature can be controlled systematically. Scanning tunneling microscopy (STM) has been used to study the surface properties. The (dI/dV)/(I/V) values have been calculated to study the local density of states (LDOS) on the film surface. Experiment results have been analyzed by Raman spectra to see the influence of the substrate temperature. Thin films CNX with nitrogen content of 32% have been investigated by X-ray photoelectron spectroscopy (XPS). The results can reveal the formation of different bonds. Fourier transform infrared spectra (FTIR) was also used to study the bonding of films. The hardness of the synthesized thin film was analyzed by a nanoindentor. The result shows that the carbon nitride films have high hardness.

Original languageEnglish (US)
Pages (from-to)469-477
Number of pages9
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3933
StatePublished - Jan 1 2000
EventLaser Applications in Microelectronic and Optoelectronic Manufacturing V - San Jose, CA, USA
Duration: Jan 24 2000Jan 26 2000

Fingerprint

Pulsed Laser Deposition
carbon nitrides
Nitrides
Carbon nitride
Ion sources
Pulsed laser deposition
ion sources
pulsed laser deposition
Thin Films
Carbon
Thin films
Hardness
hardness
thin films
Substrate
Ion Implantation
Raman Spectra
X-ray Spectroscopy
Scanning tunneling microscopy
Density of States

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Ion-source-assisted pulsed laser deposition of carbon nitride thin films. / He, Z. F.; Lu, Yongfeng; Mai, Z. H.; Ren, Z. M.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 3933, 01.01.2000, p. 469-477.

Research output: Contribution to journalConference article

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AB - Ion source assisted pulsed laser deposition has been used to synthesize carbon nitride thin films. This synthesis method has both advantages of pulsed laser deposition (PLD) and ion implantation. The average ion beam current, the beam voltage, the laser pulse energy, and substrate temperature can be controlled systematically. Scanning tunneling microscopy (STM) has been used to study the surface properties. The (dI/dV)/(I/V) values have been calculated to study the local density of states (LDOS) on the film surface. Experiment results have been analyzed by Raman spectra to see the influence of the substrate temperature. Thin films CNX with nitrogen content of 32% have been investigated by X-ray photoelectron spectroscopy (XPS). The results can reveal the formation of different bonds. Fourier transform infrared spectra (FTIR) was also used to study the bonding of films. The hardness of the synthesized thin film was analyzed by a nanoindentor. The result shows that the carbon nitride films have high hardness.

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