In-situ monitor and control using fast spectroscopic ellipsometry

John A. Woollam, Xiang Gao, Scott Heckens, James N. Hilfiker

Research output: Contribution to journalConference article

5 Citations (Scopus)

Abstract

A four gun magnetron sputter deposition chamber equipped with in-situ spectroscopic ellipsometry is described, and the results of precisely controlled multilayered metallic and dielectric materials are reported. These structures have applications in magneto-optic memories, as well as giant magneto resistance (GMR) and spin-valve magnetic readheads.

Original languageEnglish (US)
Pages (from-to)140-143
Number of pages4
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume2873
DOIs
StatePublished - Aug 16 1996
EventInternational Symposium on Polarization Analysis and Applications to Device Technology 1996 - Yokohama, Japan
Duration: Jun 12 1996Jun 14 1996

Fingerprint

Magneto-optics
Spectroscopic Ellipsometry
Giant magnetoresistance
Magnetoresistance
Magnetooptical effects
Sputter deposition
Spectroscopic ellipsometry
magneto-optics
ellipsometry
monitors
Monitor
chambers
Data storage equipment

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

In-situ monitor and control using fast spectroscopic ellipsometry. / Woollam, John A.; Gao, Xiang; Heckens, Scott; Hilfiker, James N.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 2873, 16.08.1996, p. 140-143.

Research output: Contribution to journalConference article

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