In-situ ellipsometric characterization of the electrodeposition of metal films

James N. Hilfiker, Daniel W. Thompson, Jeffrey S. Hale, John A. Woollam

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

The long-term objective of this work is to develop novel material structures and low-cost methods to prepare magneto-optic thin film materials. Ellipsometry offers diagnostics of the nucleation and growth processes on a nanometer-thickness scale. Magnetic Ni metal films were electrodeposited from sulfamate-based solutions using a galvanostatic technique. The deposition process was monitored in-situ using a spectroscopic ellipsometer measuring at 44 wavelengths simultaneously from 410 to 750 nm in real time. The spectral range for good data was limited by the transparency of the solution. Ellipsometric measurements were used to find the optical constants and growth rates for a series of depositions. Measurements of the charge passing through the sample during the growth were also used to monitor growth rates. These results were compared with the growth rates found from ellipsometric measurements. The comparison shows the two techniques to be in reasonable agreement and the advantages of each technique is discussed.

Original languageEnglish (US)
Pages (from-to)73-77
Number of pages5
JournalThin Solid Films
Volume270
Issue number1-2
DOIs
StatePublished - Dec 1 1995

Fingerprint

metal films
Electrodeposition
electrodeposition
Metals
Magnetooptical effects
Optical constants
Ellipsometry
Transparency
Nucleation
magnetic metals
ellipsometers
magneto-optics
Thin films
Wavelength
ellipsometry
Costs
nucleation
thin films
wavelengths

Keywords

  • Deposition process
  • Ellipsometry
  • Metals

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

In-situ ellipsometric characterization of the electrodeposition of metal films. / Hilfiker, James N.; Thompson, Daniel W.; Hale, Jeffrey S.; Woollam, John A.

In: Thin Solid Films, Vol. 270, No. 1-2, 01.12.1995, p. 73-77.

Research output: Contribution to journalArticle

Hilfiker, James N. ; Thompson, Daniel W. ; Hale, Jeffrey S. ; Woollam, John A. / In-situ ellipsometric characterization of the electrodeposition of metal films. In: Thin Solid Films. 1995 ; Vol. 270, No. 1-2. pp. 73-77.
@article{5ffa4ea7d9eb4e26ae4d13fc73a24108,
title = "In-situ ellipsometric characterization of the electrodeposition of metal films",
abstract = "The long-term objective of this work is to develop novel material structures and low-cost methods to prepare magneto-optic thin film materials. Ellipsometry offers diagnostics of the nucleation and growth processes on a nanometer-thickness scale. Magnetic Ni metal films were electrodeposited from sulfamate-based solutions using a galvanostatic technique. The deposition process was monitored in-situ using a spectroscopic ellipsometer measuring at 44 wavelengths simultaneously from 410 to 750 nm in real time. The spectral range for good data was limited by the transparency of the solution. Ellipsometric measurements were used to find the optical constants and growth rates for a series of depositions. Measurements of the charge passing through the sample during the growth were also used to monitor growth rates. These results were compared with the growth rates found from ellipsometric measurements. The comparison shows the two techniques to be in reasonable agreement and the advantages of each technique is discussed.",
keywords = "Deposition process, Ellipsometry, Metals",
author = "Hilfiker, {James N.} and Thompson, {Daniel W.} and Hale, {Jeffrey S.} and Woollam, {John A.}",
year = "1995",
month = "12",
day = "1",
doi = "10.1016/0040-6090(95)06851-1",
language = "English (US)",
volume = "270",
pages = "73--77",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "1-2",

}

TY - JOUR

T1 - In-situ ellipsometric characterization of the electrodeposition of metal films

AU - Hilfiker, James N.

AU - Thompson, Daniel W.

AU - Hale, Jeffrey S.

AU - Woollam, John A.

PY - 1995/12/1

Y1 - 1995/12/1

N2 - The long-term objective of this work is to develop novel material structures and low-cost methods to prepare magneto-optic thin film materials. Ellipsometry offers diagnostics of the nucleation and growth processes on a nanometer-thickness scale. Magnetic Ni metal films were electrodeposited from sulfamate-based solutions using a galvanostatic technique. The deposition process was monitored in-situ using a spectroscopic ellipsometer measuring at 44 wavelengths simultaneously from 410 to 750 nm in real time. The spectral range for good data was limited by the transparency of the solution. Ellipsometric measurements were used to find the optical constants and growth rates for a series of depositions. Measurements of the charge passing through the sample during the growth were also used to monitor growth rates. These results were compared with the growth rates found from ellipsometric measurements. The comparison shows the two techniques to be in reasonable agreement and the advantages of each technique is discussed.

AB - The long-term objective of this work is to develop novel material structures and low-cost methods to prepare magneto-optic thin film materials. Ellipsometry offers diagnostics of the nucleation and growth processes on a nanometer-thickness scale. Magnetic Ni metal films were electrodeposited from sulfamate-based solutions using a galvanostatic technique. The deposition process was monitored in-situ using a spectroscopic ellipsometer measuring at 44 wavelengths simultaneously from 410 to 750 nm in real time. The spectral range for good data was limited by the transparency of the solution. Ellipsometric measurements were used to find the optical constants and growth rates for a series of depositions. Measurements of the charge passing through the sample during the growth were also used to monitor growth rates. These results were compared with the growth rates found from ellipsometric measurements. The comparison shows the two techniques to be in reasonable agreement and the advantages of each technique is discussed.

KW - Deposition process

KW - Ellipsometry

KW - Metals

UR - http://www.scopus.com/inward/record.url?scp=0029546189&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0029546189&partnerID=8YFLogxK

U2 - 10.1016/0040-6090(95)06851-1

DO - 10.1016/0040-6090(95)06851-1

M3 - Article

AN - SCOPUS:0029546189

VL - 270

SP - 73

EP - 77

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 1-2

ER -