In situ and ex situ applications of spectroscopic ellipsometry

John A. Woollam, Blaine Johs, William A. McGahan, Paul G. Snyder, Jeffrey Hale, Huade Walter Yao

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations

Abstract

We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.

Original languageEnglish (US)
Title of host publicationDiagnostic Techniques for Semiconductor Materials Processing
PublisherPubl by Materials Research Society
Pages15-25
Number of pages11
ISBN (Print)1558992235
Publication statusPublished - Jan 1 1994
EventProceedings of the 1993 Fall Meeting of the Materials Research Society - Boston, MA, USA
Duration: Nov 29 1993Dec 2 1993

Publication series

NameMaterials Research Society Symposium Proceedings
Volume324
ISSN (Print)0272-9172

Other

OtherProceedings of the 1993 Fall Meeting of the Materials Research Society
CityBoston, MA, USA
Period11/29/9312/2/93

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ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Woollam, J. A., Johs, B., McGahan, W. A., Snyder, P. G., Hale, J., & Yao, H. W. (1994). In situ and ex situ applications of spectroscopic ellipsometry. In Diagnostic Techniques for Semiconductor Materials Processing (pp. 15-25). (Materials Research Society Symposium Proceedings; Vol. 324). Publ by Materials Research Society.