In situ and ex situ applications of spectroscopic ellipsometry

John A Woollam, Blaine Johs, William A. McGahan, Paul G. Snyder, Jeffrey Hale, Huade Walter Yao

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.

Original languageEnglish (US)
Title of host publicationDiagnostic Techniques for Semiconductor Materials Processing
PublisherPubl by Materials Research Society
Pages15-25
Number of pages11
ISBN (Print)1558992235
StatePublished - Jan 1 1994
EventProceedings of the 1993 Fall Meeting of the Materials Research Society - Boston, MA, USA
Duration: Nov 29 1993Dec 2 1993

Publication series

NameMaterials Research Society Symposium Proceedings
Volume324
ISSN (Print)0272-9172

Other

OtherProceedings of the 1993 Fall Meeting of the Materials Research Society
CityBoston, MA, USA
Period11/29/9312/2/93

Fingerprint

Semiconductor growth
Flat panel displays
Spectroscopic ellipsometry
Ellipsometry
Silicon
silicon
Integrated circuits
Optics
Multilayers
Fabrication
substrate
Substrates
stack
semiconductor
in situ
material

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Engineering(all)
  • Earth and Planetary Sciences(all)
  • Environmental Science(all)

Cite this

Woollam, J. A., Johs, B., McGahan, W. A., Snyder, P. G., Hale, J., & Yao, H. W. (1994). In situ and ex situ applications of spectroscopic ellipsometry. In Diagnostic Techniques for Semiconductor Materials Processing (pp. 15-25). (Materials Research Society Symposium Proceedings; Vol. 324). Publ by Materials Research Society.

In situ and ex situ applications of spectroscopic ellipsometry. / Woollam, John A; Johs, Blaine; McGahan, William A.; Snyder, Paul G.; Hale, Jeffrey; Yao, Huade Walter.

Diagnostic Techniques for Semiconductor Materials Processing. Publ by Materials Research Society, 1994. p. 15-25 (Materials Research Society Symposium Proceedings; Vol. 324).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Woollam, JA, Johs, B, McGahan, WA, Snyder, PG, Hale, J & Yao, HW 1994, In situ and ex situ applications of spectroscopic ellipsometry. in Diagnostic Techniques for Semiconductor Materials Processing. Materials Research Society Symposium Proceedings, vol. 324, Publ by Materials Research Society, pp. 15-25, Proceedings of the 1993 Fall Meeting of the Materials Research Society, Boston, MA, USA, 11/29/93.
Woollam JA, Johs B, McGahan WA, Snyder PG, Hale J, Yao HW. In situ and ex situ applications of spectroscopic ellipsometry. In Diagnostic Techniques for Semiconductor Materials Processing. Publ by Materials Research Society. 1994. p. 15-25. (Materials Research Society Symposium Proceedings).
Woollam, John A ; Johs, Blaine ; McGahan, William A. ; Snyder, Paul G. ; Hale, Jeffrey ; Yao, Huade Walter. / In situ and ex situ applications of spectroscopic ellipsometry. Diagnostic Techniques for Semiconductor Materials Processing. Publ by Materials Research Society, 1994. pp. 15-25 (Materials Research Society Symposium Proceedings).
@inproceedings{1a6e0bd742704afd91d3bc1ca2e225d3,
title = "In situ and ex situ applications of spectroscopic ellipsometry",
abstract = "We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.",
author = "Woollam, {John A} and Blaine Johs and McGahan, {William A.} and Snyder, {Paul G.} and Jeffrey Hale and Yao, {Huade Walter}",
year = "1994",
month = "1",
day = "1",
language = "English (US)",
isbn = "1558992235",
series = "Materials Research Society Symposium Proceedings",
publisher = "Publ by Materials Research Society",
pages = "15--25",
booktitle = "Diagnostic Techniques for Semiconductor Materials Processing",

}

TY - GEN

T1 - In situ and ex situ applications of spectroscopic ellipsometry

AU - Woollam, John A

AU - Johs, Blaine

AU - McGahan, William A.

AU - Snyder, Paul G.

AU - Hale, Jeffrey

AU - Yao, Huade Walter

PY - 1994/1/1

Y1 - 1994/1/1

N2 - We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.

AB - We briefly review the optics of ellipsometry, followed by discussions of a series of example applications of the technique including single films on a substrate; multilayer stacks common to silicon integrated circuit fabrication; flat panel display materials, and in situ semiconductor growth and deposition control.

UR - http://www.scopus.com/inward/record.url?scp=0028092635&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0028092635&partnerID=8YFLogxK

M3 - Conference contribution

SN - 1558992235

T3 - Materials Research Society Symposium Proceedings

SP - 15

EP - 25

BT - Diagnostic Techniques for Semiconductor Materials Processing

PB - Publ by Materials Research Society

ER -