High-throughput microchannel fabrication in fused silica by temporally shaped femtosecond laser Bessel-beam-assisted chemical etching

Zhi Wang, Lan Jiang, Xiaowei Li, Andong Wang, Zhulin Yao, Kaihu Zhang, Yongfeng Lu

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

We proposed combining temporally shaped (double-pulse train) laser pulses with spatially shaped (Bessel beam) laser pulses. By using a temporally shaped femtosecond laser Bessel-beam-assisted chemical etching method, the energy deposition efficiency was improved by adjusting the pulse delay to yield a stronger material modification and, thus, a higher etching depth. The etching depth was enhanced by a factor of 13 using the temporally shaped Bessel beam. The mechanism of etching depth enhancement was elucidated by localized transient-free electrons dynamics-induced structural and morphological changes. Micro-Raman spectroscopy was conducted to verify the structural changes inside the material. This method enables high-throughput, high-aspect-ratio microchannel fabrication in fused silica for potential applications in microfluidics.

Original languageEnglish (US)
Pages (from-to)98-101
Number of pages4
JournalOptics Letters
Volume43
Issue number1
DOIs
StatePublished - Jan 1 2018

Fingerprint

microchannels
etching
silicon dioxide
fabrication
pulses
lasers
high aspect ratio
free electrons
Raman spectroscopy
adjusting
laser beams
augmentation
energy

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

High-throughput microchannel fabrication in fused silica by temporally shaped femtosecond laser Bessel-beam-assisted chemical etching. / Wang, Zhi; Jiang, Lan; Li, Xiaowei; Wang, Andong; Yao, Zhulin; Zhang, Kaihu; Lu, Yongfeng.

In: Optics Letters, Vol. 43, No. 1, 01.01.2018, p. 98-101.

Research output: Contribution to journalArticle

Wang, Zhi ; Jiang, Lan ; Li, Xiaowei ; Wang, Andong ; Yao, Zhulin ; Zhang, Kaihu ; Lu, Yongfeng. / High-throughput microchannel fabrication in fused silica by temporally shaped femtosecond laser Bessel-beam-assisted chemical etching. In: Optics Letters. 2018 ; Vol. 43, No. 1. pp. 98-101.
@article{669692bf49874389978dbaefe206f33c,
title = "High-throughput microchannel fabrication in fused silica by temporally shaped femtosecond laser Bessel-beam-assisted chemical etching",
abstract = "We proposed combining temporally shaped (double-pulse train) laser pulses with spatially shaped (Bessel beam) laser pulses. By using a temporally shaped femtosecond laser Bessel-beam-assisted chemical etching method, the energy deposition efficiency was improved by adjusting the pulse delay to yield a stronger material modification and, thus, a higher etching depth. The etching depth was enhanced by a factor of 13 using the temporally shaped Bessel beam. The mechanism of etching depth enhancement was elucidated by localized transient-free electrons dynamics-induced structural and morphological changes. Micro-Raman spectroscopy was conducted to verify the structural changes inside the material. This method enables high-throughput, high-aspect-ratio microchannel fabrication in fused silica for potential applications in microfluidics.",
author = "Zhi Wang and Lan Jiang and Xiaowei Li and Andong Wang and Zhulin Yao and Kaihu Zhang and Yongfeng Lu",
year = "2018",
month = "1",
day = "1",
doi = "10.1364/OL.43.000098",
language = "English (US)",
volume = "43",
pages = "98--101",
journal = "Optics Letters",
issn = "0146-9592",
publisher = "The Optical Society",
number = "1",

}

TY - JOUR

T1 - High-throughput microchannel fabrication in fused silica by temporally shaped femtosecond laser Bessel-beam-assisted chemical etching

AU - Wang, Zhi

AU - Jiang, Lan

AU - Li, Xiaowei

AU - Wang, Andong

AU - Yao, Zhulin

AU - Zhang, Kaihu

AU - Lu, Yongfeng

PY - 2018/1/1

Y1 - 2018/1/1

N2 - We proposed combining temporally shaped (double-pulse train) laser pulses with spatially shaped (Bessel beam) laser pulses. By using a temporally shaped femtosecond laser Bessel-beam-assisted chemical etching method, the energy deposition efficiency was improved by adjusting the pulse delay to yield a stronger material modification and, thus, a higher etching depth. The etching depth was enhanced by a factor of 13 using the temporally shaped Bessel beam. The mechanism of etching depth enhancement was elucidated by localized transient-free electrons dynamics-induced structural and morphological changes. Micro-Raman spectroscopy was conducted to verify the structural changes inside the material. This method enables high-throughput, high-aspect-ratio microchannel fabrication in fused silica for potential applications in microfluidics.

AB - We proposed combining temporally shaped (double-pulse train) laser pulses with spatially shaped (Bessel beam) laser pulses. By using a temporally shaped femtosecond laser Bessel-beam-assisted chemical etching method, the energy deposition efficiency was improved by adjusting the pulse delay to yield a stronger material modification and, thus, a higher etching depth. The etching depth was enhanced by a factor of 13 using the temporally shaped Bessel beam. The mechanism of etching depth enhancement was elucidated by localized transient-free electrons dynamics-induced structural and morphological changes. Micro-Raman spectroscopy was conducted to verify the structural changes inside the material. This method enables high-throughput, high-aspect-ratio microchannel fabrication in fused silica for potential applications in microfluidics.

UR - http://www.scopus.com/inward/record.url?scp=85039548266&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85039548266&partnerID=8YFLogxK

U2 - 10.1364/OL.43.000098

DO - 10.1364/OL.43.000098

M3 - Article

C2 - 29328212

AN - SCOPUS:85039548266

VL - 43

SP - 98

EP - 101

JO - Optics Letters

JF - Optics Letters

SN - 0146-9592

IS - 1

ER -