High coercivity SmFeSiC films fabricated by multilayer sputtering

S. Y. Zhang, Z. S. Shan, Y. Liu, D. J. Sellmyer, T. Y. Zhao, J. G. Zhao, B. G. Shen

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

SmFeSiC thin films have been obtained by sputtering SmFe/C(Si) multilayers with a Ta underlayer on Si substrates and subsequently annealing at 700°C. The coercivity of the SmFeSiC films strongly depends on the sputtering and annealing conditions. The influence of the thickness of the Ta underlayer, the thickness ratio of SmFe to C(Si), the argon pressure and heat treatment In- plane coercivities up to 7.2 kOe and squareness of 0.94 were obtained.

Original languageEnglish (US)
Pages (from-to)4550-4552
Number of pages3
JournalIEEE Transactions on Magnetics
Volume32
Issue number5 PART 2
DOIs
Publication statusPublished - Dec 1 1996

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

Zhang, S. Y., Shan, Z. S., Liu, Y., Sellmyer, D. J., Zhao, T. Y., Zhao, J. G., & Shen, B. G. (1996). High coercivity SmFeSiC films fabricated by multilayer sputtering. IEEE Transactions on Magnetics, 32(5 PART 2), 4550-4552. https://doi.org/10.1109/20.539077