Grain-size and impurity effects in low-temperature deposition of TiN

H. Karimy, F. Namavar, E. Tobin, J. Haupt, R. Bricault, J. P. Hirvonen, R. Ayer

Research output: Contribution to journalConference article

4 Citations (Scopus)

Abstract

Commercially deposited titanium nitride (TiN) thin films have been available during recent years. These TiN films possess high hardness and have good wear resistance; however, the deposition process typically requires a temperature of 500°C or higher. In many cases, due to substrate characteristics, a deposition temperature below 150°C is required in order to exploit TiN coating properties. The objective of this work is to demonstrate that ion beam assisted deposition (IBAD) makes it possible to deposit gold-color TiN films with good adhesion onto a variety of substrates including plastics at temperatures below 150°C. These films have physical and mechanical properties as good as those produced at high temperatures. Samples have also been examined by nanohardness techniques to accurately determine the hardness of the films and relate them to process parameters and crystal sizes. Our results indicate that, by controlling the grain size of TiN, it is possible to fabricate TiN coatings at room temperature with hardness as high as 25.5 ± 1 GPa.

Original languageEnglish (US)
Pages (from-to)709-714
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume438
StatePublished - Dec 1 1996
EventProceedings of the 1996 MRS Fall Meeting - Boston, MA, USA
Duration: Dec 2 1996Dec 6 1996

Fingerprint

Titanium nitride
titanium nitrides
grain size
Impurities
impurities
hardness
Hardness
Temperature
Gold deposits
Nanohardness
Ion beam assisted deposition
coatings
Coatings
Substrates
wear resistance
Wear resistance
temperature
titanium nitride
adhesion
Adhesion

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Karimy, H., Namavar, F., Tobin, E., Haupt, J., Bricault, R., Hirvonen, J. P., & Ayer, R. (1996). Grain-size and impurity effects in low-temperature deposition of TiN. Materials Research Society Symposium - Proceedings, 438, 709-714.

Grain-size and impurity effects in low-temperature deposition of TiN. / Karimy, H.; Namavar, F.; Tobin, E.; Haupt, J.; Bricault, R.; Hirvonen, J. P.; Ayer, R.

In: Materials Research Society Symposium - Proceedings, Vol. 438, 01.12.1996, p. 709-714.

Research output: Contribution to journalConference article

Karimy, H, Namavar, F, Tobin, E, Haupt, J, Bricault, R, Hirvonen, JP & Ayer, R 1996, 'Grain-size and impurity effects in low-temperature deposition of TiN', Materials Research Society Symposium - Proceedings, vol. 438, pp. 709-714.
Karimy H, Namavar F, Tobin E, Haupt J, Bricault R, Hirvonen JP et al. Grain-size and impurity effects in low-temperature deposition of TiN. Materials Research Society Symposium - Proceedings. 1996 Dec 1;438:709-714.
Karimy, H. ; Namavar, F. ; Tobin, E. ; Haupt, J. ; Bricault, R. ; Hirvonen, J. P. ; Ayer, R. / Grain-size and impurity effects in low-temperature deposition of TiN. In: Materials Research Society Symposium - Proceedings. 1996 ; Vol. 438. pp. 709-714.
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