Femtosecond Bessel-beam-assisted high-aspect-ratio microgroove fabrication in fused silica

Liangliang Zhao, Feng Wang, Lan Jiang, Yongfeng Lu, Weiwei Zhao, Jun Xie, Xiaowei Li

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

A simple and repeatable method to fabricate high-aspect-ratio (HAR) and high-quality microgrooves in silica is reported. The method consists of two steps: (1) formation of laser-modified regions by femtosecond Bessel beam irradiation, and (2) removing laser-modified regions through HF etching. Uniform, straight microgrooves can be fabricated and the highest aspect ratio that can be reached is ~52. The phenomenon is attributed to the uniform energy distribution in the long propagation distance, which leads to the long and uniform laser-modified regions and subsequent HF acid etching of laser-modified regions with high selectivity. This method will have potential applications in fabrication of HAR microgrooves in transparent materials.

Original languageEnglish (US)
Article number041405
JournalChinese Optics Letters
Volume13
Issue number4
DOIs
StatePublished - Apr 10 2015

Fingerprint

Fused silica
high aspect ratio
Aspect ratio
silicon dioxide
Fabrication
fabrication
Lasers
lasers
Etching
etching
transparence
Silicon Dioxide
energy distribution
selectivity
Silica
Irradiation
acids
irradiation
Acids
propagation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this

Femtosecond Bessel-beam-assisted high-aspect-ratio microgroove fabrication in fused silica. / Zhao, Liangliang; Wang, Feng; Jiang, Lan; Lu, Yongfeng; Zhao, Weiwei; Xie, Jun; Li, Xiaowei.

In: Chinese Optics Letters, Vol. 13, No. 4, 041405, 10.04.2015.

Research output: Contribution to journalArticle

Zhao, Liangliang ; Wang, Feng ; Jiang, Lan ; Lu, Yongfeng ; Zhao, Weiwei ; Xie, Jun ; Li, Xiaowei. / Femtosecond Bessel-beam-assisted high-aspect-ratio microgroove fabrication in fused silica. In: Chinese Optics Letters. 2015 ; Vol. 13, No. 4.
@article{01de15ccab0c44c3ab214daae49d13cc,
title = "Femtosecond Bessel-beam-assisted high-aspect-ratio microgroove fabrication in fused silica",
abstract = "A simple and repeatable method to fabricate high-aspect-ratio (HAR) and high-quality microgrooves in silica is reported. The method consists of two steps: (1) formation of laser-modified regions by femtosecond Bessel beam irradiation, and (2) removing laser-modified regions through HF etching. Uniform, straight microgrooves can be fabricated and the highest aspect ratio that can be reached is ~52. The phenomenon is attributed to the uniform energy distribution in the long propagation distance, which leads to the long and uniform laser-modified regions and subsequent HF acid etching of laser-modified regions with high selectivity. This method will have potential applications in fabrication of HAR microgrooves in transparent materials.",
author = "Liangliang Zhao and Feng Wang and Lan Jiang and Yongfeng Lu and Weiwei Zhao and Jun Xie and Xiaowei Li",
year = "2015",
month = "4",
day = "10",
doi = "10.3788/COL201513.041405",
language = "English (US)",
volume = "13",
journal = "Chinese Optics Letters",
issn = "1671-7694",
publisher = "Science Press",
number = "4",

}

TY - JOUR

T1 - Femtosecond Bessel-beam-assisted high-aspect-ratio microgroove fabrication in fused silica

AU - Zhao, Liangliang

AU - Wang, Feng

AU - Jiang, Lan

AU - Lu, Yongfeng

AU - Zhao, Weiwei

AU - Xie, Jun

AU - Li, Xiaowei

PY - 2015/4/10

Y1 - 2015/4/10

N2 - A simple and repeatable method to fabricate high-aspect-ratio (HAR) and high-quality microgrooves in silica is reported. The method consists of two steps: (1) formation of laser-modified regions by femtosecond Bessel beam irradiation, and (2) removing laser-modified regions through HF etching. Uniform, straight microgrooves can be fabricated and the highest aspect ratio that can be reached is ~52. The phenomenon is attributed to the uniform energy distribution in the long propagation distance, which leads to the long and uniform laser-modified regions and subsequent HF acid etching of laser-modified regions with high selectivity. This method will have potential applications in fabrication of HAR microgrooves in transparent materials.

AB - A simple and repeatable method to fabricate high-aspect-ratio (HAR) and high-quality microgrooves in silica is reported. The method consists of two steps: (1) formation of laser-modified regions by femtosecond Bessel beam irradiation, and (2) removing laser-modified regions through HF etching. Uniform, straight microgrooves can be fabricated and the highest aspect ratio that can be reached is ~52. The phenomenon is attributed to the uniform energy distribution in the long propagation distance, which leads to the long and uniform laser-modified regions and subsequent HF acid etching of laser-modified regions with high selectivity. This method will have potential applications in fabrication of HAR microgrooves in transparent materials.

UR - http://www.scopus.com/inward/record.url?scp=84930535981&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84930535981&partnerID=8YFLogxK

U2 - 10.3788/COL201513.041405

DO - 10.3788/COL201513.041405

M3 - Article

AN - SCOPUS:84930535981

VL - 13

JO - Chinese Optics Letters

JF - Chinese Optics Letters

SN - 1671-7694

IS - 4

M1 - 041405

ER -