Fast ICCD imaging of KrF excimer laser induced titanium plasma plumes for silicon metallization

M. H. Hong, Y. F. Lu, T. M. Ho, L. W. Lu, T. S. Low

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Pulsed laser deposition (PLD) is applied to grow titanium thin films on silicon substrates for wafer metallization. Dynamics of plasma during the thin film deposition is investigated by fast intensified charge coupled detector (ICCD) time integrated photography. Plasma images at different gate delays after laser irradiation are taken to study plasma size, distribution, expansion and interaction with the substrates. Plume flying and expansion speeds in the directions normal and parallel to target surface are calculated. Fast ICCD imaging shows that the plasma starts to fly and expand at speeds as high as 10 6 cm/s and reduces gradually to zero with gate delay. The dependence of plume size and speeds on laser fluence, gate delay, target-to-substrate distance and chamber pressure is analyzed to optimize processing parameters for the thin film deposition.

Original languageEnglish (US)
Pages (from-to)489-493
Number of pages5
JournalApplied Surface Science
Volume138-139
Issue number1-4
DOIs
StatePublished - Jan 1999

Fingerprint

Excimer lasers
Silicon
Metallizing
Titanium
excimer lasers
plumes
titanium
Detectors
Plasmas
Imaging techniques
detectors
silicon
Thin films
Substrates
thin films
pressure chambers
expansion
photography
Photography
Beam plasma interactions

Keywords

  • ICCD imaging
  • Plasma dynamics
  • Pulsed laser deposition
  • Titanium plasma

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

Fast ICCD imaging of KrF excimer laser induced titanium plasma plumes for silicon metallization. / Hong, M. H.; Lu, Y. F.; Ho, T. M.; Lu, L. W.; Low, T. S.

In: Applied Surface Science, Vol. 138-139, No. 1-4, 01.1999, p. 489-493.

Research output: Contribution to journalArticle

Hong, M. H. ; Lu, Y. F. ; Ho, T. M. ; Lu, L. W. ; Low, T. S. / Fast ICCD imaging of KrF excimer laser induced titanium plasma plumes for silicon metallization. In: Applied Surface Science. 1999 ; Vol. 138-139, No. 1-4. pp. 489-493.
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