Fabrication of nanopillars by nanosphere lithography

C. L. Cheung, R. J. Nikolić, C. E. Reinhardt, T. F. Wang

Research output: Contribution to journalArticle

227 Citations (Scopus)

Abstract

A low cost nanosphere lithography method for patterning and generation of semiconductor nanostructures provides a potential alternative to the conventional top-down fabrication techniques. Forests of silicon pillars of sub-500 nm diameter and with an aspect ratio up to 10 were fabricated using a combination of the nanosphere lithography and deep reactive ion etching techniques. The nanosphere etch mask coated silicon substrates were etched using oxygen plasma and a time-multiplexed 'Bosch' process to produce nanopillars of different length, diameter and separation. Scanning electron microscopy data indicate that the silicon etch rates with the nanoscale etch masks decrease linearly with increasing aspect ratio of the resulting etch structures.

Original languageEnglish (US)
Pages (from-to)1339-1343
Number of pages5
JournalNanotechnology
Volume17
Issue number5
DOIs
StatePublished - Mar 14 2006

Fingerprint

Nanospheres
Silicon
Lithography
lithography
Fabrication
fabrication
aspect ratio
Aspect ratio
Masks
silicon
masks
Reactive ion etching
oxygen plasma
Nanostructures
etching
Semiconductor materials
Oxygen
Plasmas
Scanning electron microscopy
scanning electron microscopy

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Cheung, C. L., Nikolić, R. J., Reinhardt, C. E., & Wang, T. F. (2006). Fabrication of nanopillars by nanosphere lithography. Nanotechnology, 17(5), 1339-1343. https://doi.org/10.1088/0957-4484/17/5/028

Fabrication of nanopillars by nanosphere lithography. / Cheung, C. L.; Nikolić, R. J.; Reinhardt, C. E.; Wang, T. F.

In: Nanotechnology, Vol. 17, No. 5, 14.03.2006, p. 1339-1343.

Research output: Contribution to journalArticle

Cheung, CL, Nikolić, RJ, Reinhardt, CE & Wang, TF 2006, 'Fabrication of nanopillars by nanosphere lithography', Nanotechnology, vol. 17, no. 5, pp. 1339-1343. https://doi.org/10.1088/0957-4484/17/5/028
Cheung, C. L. ; Nikolić, R. J. ; Reinhardt, C. E. ; Wang, T. F. / Fabrication of nanopillars by nanosphere lithography. In: Nanotechnology. 2006 ; Vol. 17, No. 5. pp. 1339-1343.
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