Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification

Ji Huang, Lan Jiang, Xiaowei Li, Andong Wang, Zhi Wang, Qingsong Wang, Jie Hu, Liangti Qu, Tianhong Cui, Yongfeng Lu

Research output: Contribution to journalArticle

Abstract

Femtosecond laser direct writing is widely exploited in surface periodic structures processing. However, this technique still faces challenges in obtaining high surface homogeneity and flexible morphology controllability. In this study, a flexible and efficient approach has been proposed to fabricate highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification. By precisely manipulating the laser-material interaction process, alternating amorphous-crystalline nanofringes are generated when employing femtosecond laser scanning over a Si sample, with almost no material removal. Following auxiliary chemical etching, highly homogeneous nanograting structures are obtained, and the morphology of the nanogratings can be flexibly managed through precisely controlling the duration of the etching process. Complex cross-scale patterns with remarkable structural colors that are visible under indoor light illumination are readily achieved on the sample surfaces exploiting our method. In addition, compared with traditional methods for laser-induced periodic surface structures, the fabrication efficiency is considerably improved. Our processing procedure offers potential applications in the fields of optics, nanoelectronics, and mechatronics.

Original languageEnglish (US)
Pages (from-to)869-878
Number of pages10
JournalNanophotonics
Volume8
Issue number5
DOIs
StatePublished - Jan 1 2019

Fingerprint

Silicon
Ultrashort pulses
Etching
Lasers
etching
Fabrication
fabrication
silicon
lasers
Nanoelectronics
Mechatronics
Periodic structures
Processing
Controllability
Surface structure
laser materials
Optics
controllability
Lighting
machining

Keywords

  • chemical etching
  • femtosecond laser
  • highly controllable
  • highly homogeneous
  • nanograting structures

ASJC Scopus subject areas

  • Biotechnology
  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

Cite this

Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification. / Huang, Ji; Jiang, Lan; Li, Xiaowei; Wang, Andong; Wang, Zhi; Wang, Qingsong; Hu, Jie; Qu, Liangti; Cui, Tianhong; Lu, Yongfeng.

In: Nanophotonics, Vol. 8, No. 5, 01.01.2019, p. 869-878.

Research output: Contribution to journalArticle

Huang, Ji ; Jiang, Lan ; Li, Xiaowei ; Wang, Andong ; Wang, Zhi ; Wang, Qingsong ; Hu, Jie ; Qu, Liangti ; Cui, Tianhong ; Lu, Yongfeng. / Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification. In: Nanophotonics. 2019 ; Vol. 8, No. 5. pp. 869-878.
@article{98b0ec3e7edd4065b08167ee263de6d7,
title = "Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification",
abstract = "Femtosecond laser direct writing is widely exploited in surface periodic structures processing. However, this technique still faces challenges in obtaining high surface homogeneity and flexible morphology controllability. In this study, a flexible and efficient approach has been proposed to fabricate highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification. By precisely manipulating the laser-material interaction process, alternating amorphous-crystalline nanofringes are generated when employing femtosecond laser scanning over a Si sample, with almost no material removal. Following auxiliary chemical etching, highly homogeneous nanograting structures are obtained, and the morphology of the nanogratings can be flexibly managed through precisely controlling the duration of the etching process. Complex cross-scale patterns with remarkable structural colors that are visible under indoor light illumination are readily achieved on the sample surfaces exploiting our method. In addition, compared with traditional methods for laser-induced periodic surface structures, the fabrication efficiency is considerably improved. Our processing procedure offers potential applications in the fields of optics, nanoelectronics, and mechatronics.",
keywords = "chemical etching, femtosecond laser, highly controllable, highly homogeneous, nanograting structures",
author = "Ji Huang and Lan Jiang and Xiaowei Li and Andong Wang and Zhi Wang and Qingsong Wang and Jie Hu and Liangti Qu and Tianhong Cui and Yongfeng Lu",
year = "2019",
month = "1",
day = "1",
doi = "10.1515/nanoph-2019-0056",
language = "English (US)",
volume = "8",
pages = "869--878",
journal = "Nanophotonics",
issn = "2192-8606",
publisher = "Walter De Gruyter",
number = "5",

}

TY - JOUR

T1 - Fabrication of highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification

AU - Huang, Ji

AU - Jiang, Lan

AU - Li, Xiaowei

AU - Wang, Andong

AU - Wang, Zhi

AU - Wang, Qingsong

AU - Hu, Jie

AU - Qu, Liangti

AU - Cui, Tianhong

AU - Lu, Yongfeng

PY - 2019/1/1

Y1 - 2019/1/1

N2 - Femtosecond laser direct writing is widely exploited in surface periodic structures processing. However, this technique still faces challenges in obtaining high surface homogeneity and flexible morphology controllability. In this study, a flexible and efficient approach has been proposed to fabricate highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification. By precisely manipulating the laser-material interaction process, alternating amorphous-crystalline nanofringes are generated when employing femtosecond laser scanning over a Si sample, with almost no material removal. Following auxiliary chemical etching, highly homogeneous nanograting structures are obtained, and the morphology of the nanogratings can be flexibly managed through precisely controlling the duration of the etching process. Complex cross-scale patterns with remarkable structural colors that are visible under indoor light illumination are readily achieved on the sample surfaces exploiting our method. In addition, compared with traditional methods for laser-induced periodic surface structures, the fabrication efficiency is considerably improved. Our processing procedure offers potential applications in the fields of optics, nanoelectronics, and mechatronics.

AB - Femtosecond laser direct writing is widely exploited in surface periodic structures processing. However, this technique still faces challenges in obtaining high surface homogeneity and flexible morphology controllability. In this study, a flexible and efficient approach has been proposed to fabricate highly homogeneous and controllable nanogratings on silicon via chemical etching-assisted femtosecond laser modification. By precisely manipulating the laser-material interaction process, alternating amorphous-crystalline nanofringes are generated when employing femtosecond laser scanning over a Si sample, with almost no material removal. Following auxiliary chemical etching, highly homogeneous nanograting structures are obtained, and the morphology of the nanogratings can be flexibly managed through precisely controlling the duration of the etching process. Complex cross-scale patterns with remarkable structural colors that are visible under indoor light illumination are readily achieved on the sample surfaces exploiting our method. In addition, compared with traditional methods for laser-induced periodic surface structures, the fabrication efficiency is considerably improved. Our processing procedure offers potential applications in the fields of optics, nanoelectronics, and mechatronics.

KW - chemical etching

KW - femtosecond laser

KW - highly controllable

KW - highly homogeneous

KW - nanograting structures

UR - http://www.scopus.com/inward/record.url?scp=85065446614&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85065446614&partnerID=8YFLogxK

U2 - 10.1515/nanoph-2019-0056

DO - 10.1515/nanoph-2019-0056

M3 - Article

VL - 8

SP - 869

EP - 878

JO - Nanophotonics

JF - Nanophotonics

SN - 2192-8606

IS - 5

ER -