External-field-controlled laser wet etching of polycrystalline Al2O3TiC

Yong Feng Lu, Kai Dong Ye

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Laser-induced etching of polycrystalline Al2O3TiC material by tightly focused CW Ar ion laser has been investigated in both H3PO4 and KOH solutions with influence of an external electric field. It is found that a weak external electric field will change the ions distribution in chemical solutions and cause obvious change in etching behavior. The laser etching in a H3PO4 solution can be enhanced by both positive and negative biases of the substrate. While etching in a KOH solution, a positive bias can enhance the etching reaction, whereas a negative bias can suppress the etching process. It is also found that the external electric field can always enhance the mass transfer between reaction products and fresh etchant in a H3PO4 solution. It is revealed that the supply of H+ ions contributes to the etching process in a H3PO4 solution, while the supply of OH- ions contributes to the etching process in a KOH solution. The electric field can be used to control the etching process to achieve fast tuning and higher accuracy.

Original languageEnglish (US)
Pages (from-to)283-286
Number of pages4
JournalApplied Physics A: Materials Science and Processing
Volume63
Issue number3
StatePublished - Jan 1 1996
Externally publishedYes

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Wet etching
Etching
etching
Lasers
lasers
Electric fields
Ions
electric fields
Polycrystalline materials
ions
etchants
ion distribution
Reaction products
reaction products
mass transfer
Mass transfer
Tuning
tuning
causes
Substrates

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)

Cite this

External-field-controlled laser wet etching of polycrystalline Al2O3TiC. / Lu, Yong Feng; Ye, Kai Dong.

In: Applied Physics A: Materials Science and Processing, Vol. 63, No. 3, 01.01.1996, p. 283-286.

Research output: Contribution to journalArticle

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