Etching rate enhancement by shaped femtosecond pulse train electron dynamics control for microchannels fabrication in fused silica glass

Pengjun Liu, Lan Jiang, Jie Hu, Xueliang Yan, Bo Xia, Yongfeng Lu

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

The dependence of the etching rate on the ultrafast pulse shaping is observed when microchannels are fabricated in fused silica glass using the method of femtosecond laser irradiation followed by chemical etching. In comparison with the conventional femtosecond pulses, the temporally shaped pulse trains can greatly enhance the etching rate under the same processing conditions. The enhancement is mainly attributed to the localized transient electron dynamics control by shaping the ultrafast pulse, resulting in higher photon absorption efficiency and uniform photomodification zone. Furthermore, processing parameters, including pulse delay and pulse energy distribution ratio, have also been investigated to optimize microchannels fabrication.

Original languageEnglish (US)
Pages (from-to)4613-4616
Number of pages4
JournalOptics Letters
Volume38
Issue number22
DOIs
StatePublished - Nov 15 2013

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dynamic control
silica glass
microchannels
etching
fabrication
augmentation
pulses
electrons
energy distribution
irradiation
photons
lasers

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Etching rate enhancement by shaped femtosecond pulse train electron dynamics control for microchannels fabrication in fused silica glass. / Liu, Pengjun; Jiang, Lan; Hu, Jie; Yan, Xueliang; Xia, Bo; Lu, Yongfeng.

In: Optics Letters, Vol. 38, No. 22, 15.11.2013, p. 4613-4616.

Research output: Contribution to journalArticle

Liu, Pengjun ; Jiang, Lan ; Hu, Jie ; Yan, Xueliang ; Xia, Bo ; Lu, Yongfeng. / Etching rate enhancement by shaped femtosecond pulse train electron dynamics control for microchannels fabrication in fused silica glass. In: Optics Letters. 2013 ; Vol. 38, No. 22. pp. 4613-4616.
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