Etching rate enhancement by shaped femtosecond pulse train electron dynamics control for microchannels fabrication in fused silica glass

Pengjun Liu, Lan Jiang, Jie Hu, Xueliang Yan, Bo Xia, Yongfeng Lu

Research output: Contribution to journalArticle

11 Scopus citations

Abstract

The dependence of the etching rate on the ultrafast pulse shaping is observed when microchannels are fabricated in fused silica glass using the method of femtosecond laser irradiation followed by chemical etching. In comparison with the conventional femtosecond pulses, the temporally shaped pulse trains can greatly enhance the etching rate under the same processing conditions. The enhancement is mainly attributed to the localized transient electron dynamics control by shaping the ultrafast pulse, resulting in higher photon absorption efficiency and uniform photomodification zone. Furthermore, processing parameters, including pulse delay and pulse energy distribution ratio, have also been investigated to optimize microchannels fabrication.

Original languageEnglish (US)
Pages (from-to)4613-4616
Number of pages4
JournalOptics Letters
Volume38
Issue number22
DOIs
Publication statusPublished - Nov 15 2013

    Fingerprint

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this