Etching Rate Control by MeV O+Implantation for Laser-Chemical Reaction of Ferrite

Yongfeng Lu, Mikio Takai, Akiyoshi Chayahara, Mamoru Satou, Susumu Namba, Hiroyuki Sanda, Syohei Nagatomo

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

The control of etching rate in laser-induced chemical reaction of Mn-Zn ferrite in H3PO4solution by MeV O+implantation has been investigated. The etching induced by Ar+-ion laser irradiation in a H3PO4solution was suppressed by implantating 3 MeV O+to a dose of 1×1017cm-2when the laser power was low. The etching suppression disappeared when the O+-implanted sample was thermally annealed at 850°C for 30 min. The suppression is found to be related to the crystallinity change induced by ion implantation instead of surface reflectivity change.

Original languageEnglish (US)
Pages (from-to)2260-2264
Number of pages5
JournalJapanese Journal of Applied Physics
Volume29
Issue number10
DOIs
StatePublished - Jan 1 1990

Fingerprint

Ion implantation
Ferrite
Chemical reactions
ferrites
Etching
implantation
chemical reactions
etching
Lasers
retarding
lasers
Laser beam effects
ion implantation
crystallinity
reflectance
dosage
irradiation
Ions
ions

Keywords

  • Etching suppression
  • Ion implantation
  • Laser etching
  • Lattice disorder
  • Mn-Zn ferrite

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Lu, Y., Takai, M., Chayahara, A., Satou, M., Namba, S., Sanda, H., & Nagatomo, S. (1990). Etching Rate Control by MeV O+Implantation for Laser-Chemical Reaction of Ferrite. Japanese Journal of Applied Physics, 29(10), 2260-2264. https://doi.org/10.1143/JJAP.29.2260

Etching Rate Control by MeV O+Implantation for Laser-Chemical Reaction of Ferrite. / Lu, Yongfeng; Takai, Mikio; Chayahara, Akiyoshi; Satou, Mamoru; Namba, Susumu; Sanda, Hiroyuki; Nagatomo, Syohei.

In: Japanese Journal of Applied Physics, Vol. 29, No. 10, 01.01.1990, p. 2260-2264.

Research output: Contribution to journalArticle

Lu, Y, Takai, M, Chayahara, A, Satou, M, Namba, S, Sanda, H & Nagatomo, S 1990, 'Etching Rate Control by MeV O+Implantation for Laser-Chemical Reaction of Ferrite', Japanese Journal of Applied Physics, vol. 29, no. 10, pp. 2260-2264. https://doi.org/10.1143/JJAP.29.2260
Lu, Yongfeng ; Takai, Mikio ; Chayahara, Akiyoshi ; Satou, Mamoru ; Namba, Susumu ; Sanda, Hiroyuki ; Nagatomo, Syohei. / Etching Rate Control by MeV O+Implantation for Laser-Chemical Reaction of Ferrite. In: Japanese Journal of Applied Physics. 1990 ; Vol. 29, No. 10. pp. 2260-2264.
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