Enhanced chemical vapor deposition of diamond by wavelength-matched vibrational excitations of ethylene molecules using tunable CO2 laser irradiation

H. Ling, Z. Q. Xie, Y. Gao, T. Gebre, X. K. Shen, Yongfeng Lu

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

Wavelength-matched vibrational excitations of ethylene (C2H 4) molecules using a tunable carbon dioxide (CO2) laser were employed to significantly enhance the chemical vapor deposition (CVD) of diamond in open air using a precursor gas mixture of C2 H4, acetylene (C 2H4), and oxygen (O2). The CH2 -wag vibration mode (7) of the C2 H4 molecules was selected to achieve the resonant excitation in the CVD process. Both laser wavelengths of 10.591 and 10.532 μm were applied to the CVD processes to compare the C2H4 excitations and diamond depositions. Compared with 10.591 μm produced by common CO2 lasers, the laser wavelength of 10.532 μm is much more effective to excite the C2 H4 molecules through the CH2 -wag mode. Under the laser irradiation with a power of 800 W and a wavelength of 10.532 μm, the grain size in the deposited diamond films was increased by 400% and the film thickness was increased by 300%. The quality of the diamond crystals was also significantly enhanced.

Original languageEnglish (US)
Article number064901
JournalJournal of Applied Physics
Volume105
Issue number6
DOIs
StatePublished - Apr 9 2009

Fingerprint

tunable lasers
ethylene
diamonds
vapor deposition
irradiation
wavelengths
excitation
lasers
molecules
carbon dioxide lasers
diamond films
acetylene
gas mixtures
vibration mode
film thickness
grain size
air
oxygen
crystals

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Enhanced chemical vapor deposition of diamond by wavelength-matched vibrational excitations of ethylene molecules using tunable CO2 laser irradiation. / Ling, H.; Xie, Z. Q.; Gao, Y.; Gebre, T.; Shen, X. K.; Lu, Yongfeng.

In: Journal of Applied Physics, Vol. 105, No. 6, 064901, 09.04.2009.

Research output: Contribution to journalArticle

@article{dd91de6d41c2436f97ec037d16e916f6,
title = "Enhanced chemical vapor deposition of diamond by wavelength-matched vibrational excitations of ethylene molecules using tunable CO2 laser irradiation",
abstract = "Wavelength-matched vibrational excitations of ethylene (C2H 4) molecules using a tunable carbon dioxide (CO2) laser were employed to significantly enhance the chemical vapor deposition (CVD) of diamond in open air using a precursor gas mixture of C2 H4, acetylene (C 2H4), and oxygen (O2). The CH2 -wag vibration mode (7) of the C2 H4 molecules was selected to achieve the resonant excitation in the CVD process. Both laser wavelengths of 10.591 and 10.532 μm were applied to the CVD processes to compare the C2H4 excitations and diamond depositions. Compared with 10.591 μm produced by common CO2 lasers, the laser wavelength of 10.532 μm is much more effective to excite the C2 H4 molecules through the CH2 -wag mode. Under the laser irradiation with a power of 800 W and a wavelength of 10.532 μm, the grain size in the deposited diamond films was increased by 400{\%} and the film thickness was increased by 300{\%}. The quality of the diamond crystals was also significantly enhanced.",
author = "H. Ling and Xie, {Z. Q.} and Y. Gao and T. Gebre and Shen, {X. K.} and Yongfeng Lu",
year = "2009",
month = "4",
day = "9",
doi = "10.1063/1.3082090",
language = "English (US)",
volume = "105",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics Publising LLC",
number = "6",

}

TY - JOUR

T1 - Enhanced chemical vapor deposition of diamond by wavelength-matched vibrational excitations of ethylene molecules using tunable CO2 laser irradiation

AU - Ling, H.

AU - Xie, Z. Q.

AU - Gao, Y.

AU - Gebre, T.

AU - Shen, X. K.

AU - Lu, Yongfeng

PY - 2009/4/9

Y1 - 2009/4/9

N2 - Wavelength-matched vibrational excitations of ethylene (C2H 4) molecules using a tunable carbon dioxide (CO2) laser were employed to significantly enhance the chemical vapor deposition (CVD) of diamond in open air using a precursor gas mixture of C2 H4, acetylene (C 2H4), and oxygen (O2). The CH2 -wag vibration mode (7) of the C2 H4 molecules was selected to achieve the resonant excitation in the CVD process. Both laser wavelengths of 10.591 and 10.532 μm were applied to the CVD processes to compare the C2H4 excitations and diamond depositions. Compared with 10.591 μm produced by common CO2 lasers, the laser wavelength of 10.532 μm is much more effective to excite the C2 H4 molecules through the CH2 -wag mode. Under the laser irradiation with a power of 800 W and a wavelength of 10.532 μm, the grain size in the deposited diamond films was increased by 400% and the film thickness was increased by 300%. The quality of the diamond crystals was also significantly enhanced.

AB - Wavelength-matched vibrational excitations of ethylene (C2H 4) molecules using a tunable carbon dioxide (CO2) laser were employed to significantly enhance the chemical vapor deposition (CVD) of diamond in open air using a precursor gas mixture of C2 H4, acetylene (C 2H4), and oxygen (O2). The CH2 -wag vibration mode (7) of the C2 H4 molecules was selected to achieve the resonant excitation in the CVD process. Both laser wavelengths of 10.591 and 10.532 μm were applied to the CVD processes to compare the C2H4 excitations and diamond depositions. Compared with 10.591 μm produced by common CO2 lasers, the laser wavelength of 10.532 μm is much more effective to excite the C2 H4 molecules through the CH2 -wag mode. Under the laser irradiation with a power of 800 W and a wavelength of 10.532 μm, the grain size in the deposited diamond films was increased by 400% and the film thickness was increased by 300%. The quality of the diamond crystals was also significantly enhanced.

UR - http://www.scopus.com/inward/record.url?scp=63749099994&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=63749099994&partnerID=8YFLogxK

U2 - 10.1063/1.3082090

DO - 10.1063/1.3082090

M3 - Article

VL - 105

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 6

M1 - 064901

ER -