Ellipsometric study of Al2O3/Ag/Si and SiO 2/Ag/quartz ashed in an oxygen plasma

Bhola N. De, John A. Woollam

Research output: Contribution to journalArticle

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Abstract

Using monolayer-sensitive variable angle of incidence spectroscopic ellipsometry, the silver oxide growth on a silver mirror, coated with an Al 2 O3 or SiO2 protective layer, was investigated. The oxidation was done in a pure oxygen plasma asher. The resulting silver oxide growth was monitored accurately as a function of exposure time in the plasma asher. It was found that silver was converted to silver oxide under the protective coating, during ashing of a sample. The optical constants of a dense silver oxide thin film, created by oxidizing in the asher, were also measured.

Original languageEnglish (US)
Pages (from-to)5602-5607
Number of pages6
JournalJournal of Applied Physics
Volume66
Issue number11
DOIs
Publication statusPublished - Dec 1 1989

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ASJC Scopus subject areas

  • Physics and Astronomy(all)

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