Ellipsometric study of Al2O3/Ag/Si and SiO 2/Ag/quartz ashed in an oxygen plasma

Bhola N. De, John A Woollam

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Using monolayer-sensitive variable angle of incidence spectroscopic ellipsometry, the silver oxide growth on a silver mirror, coated with an Al 2 O3 or SiO2 protective layer, was investigated. The oxidation was done in a pure oxygen plasma asher. The resulting silver oxide growth was monitored accurately as a function of exposure time in the plasma asher. It was found that silver was converted to silver oxide under the protective coating, during ashing of a sample. The optical constants of a dense silver oxide thin film, created by oxidizing in the asher, were also measured.

Original languageEnglish (US)
Pages (from-to)5602-5607
Number of pages6
JournalJournal of Applied Physics
Volume66
Issue number11
DOIs
StatePublished - Dec 1 1989

Fingerprint

silver oxides
oxygen plasma
quartz
silver
protective coatings
ellipsometry
incidence
mirrors
oxidation
thin films

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Ellipsometric study of Al2O3/Ag/Si and SiO 2/Ag/quartz ashed in an oxygen plasma. / De, Bhola N.; Woollam, John A.

In: Journal of Applied Physics, Vol. 66, No. 11, 01.12.1989, p. 5602-5607.

Research output: Contribution to journalArticle

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