Electron paramagnetic resonance and in situ photosensitivity investigation of the photorefractive polymer BisA-NAS:DEH

A. Darwish, Nickolai V. Kukhtarev, R. Copland, R. Sliz, Putcha Venkateswarlu, H. John Caulfield, Stephen Ducharme, James M. Takacs, Lei Zhang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We have observed the electron paramagnetic resonance (EPR) signal in the photorefractive polymer BisA-NAS:DEH. The polymer is a mixture of the electro-optic polymer bisphernol A 4,4-nitroaminostilbene (BisA-NAS) with 29% by weight benzaldehyde diphenyl-hydrazone (DEH), a hole transport agent. The EPR signal was observed at 3431.590 G. Illumination of the photorefractive polymer by an Ar + laser leads to an interesting phenomenon. With an aim to understand the photosensitivity of the photorefractive polymer, we have monitored the changes in the intensity of the EPR line. The measurements were done in situ at room temperature and liquid nitrogen temperature 77 K. The sample was loaded in an optical transmission cavity to facilitate the use of the laser. When the sample is illuminating with low laser intensity, illumination decreases the EPR signal while for higher laser intensity, the EPR signal grows. We provide a tentative explanation for this phenomenon. Low laser intensity introduces photoconductivity, which reduces the EPR signal, but does not create free radicals. For higher laser intensity, paramagnetic free radicals are formed contributing to the increase of the EPR signal. The relation between observed phenomenon and photosensitivity will be discussed. Also the EPR results at low temperature will be presented.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsStephen Ducharme, Paul M. Borsenberger
Pages102-108
Number of pages7
StatePublished - Dec 1 1995
EventXerographic Photoreceptors and Photorefractive Polymers - San Diego, CA, USA
Duration: Jul 10 1995Jul 11 1995

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2526
ISSN (Print)0277-786X

Other

OtherXerographic Photoreceptors and Photorefractive Polymers
CitySan Diego, CA, USA
Period7/10/957/11/95

Fingerprint

Electron Paramagnetic Resonance
Photosensitivity
Hydrazones
hydrazones
photosensitivity
Paramagnetic resonance
electron paramagnetic resonance
Polymers
polymers
Laser
Lasers
Free Radicals
Free radicals
free radicals
high power lasers
lasers
Illumination
Lighting
illumination
Photoconductivity

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Darwish, A., Kukhtarev, N. V., Copland, R., Sliz, R., Venkateswarlu, P., Caulfield, H. J., ... Zhang, L. (1995). Electron paramagnetic resonance and in situ photosensitivity investigation of the photorefractive polymer BisA-NAS:DEH. In S. Ducharme, & P. M. Borsenberger (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (pp. 102-108). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 2526).

Electron paramagnetic resonance and in situ photosensitivity investigation of the photorefractive polymer BisA-NAS:DEH. / Darwish, A.; Kukhtarev, Nickolai V.; Copland, R.; Sliz, R.; Venkateswarlu, Putcha; Caulfield, H. John; Ducharme, Stephen; Takacs, James M.; Zhang, Lei.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Stephen Ducharme; Paul M. Borsenberger. 1995. p. 102-108 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 2526).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Darwish, A, Kukhtarev, NV, Copland, R, Sliz, R, Venkateswarlu, P, Caulfield, HJ, Ducharme, S, Takacs, JM & Zhang, L 1995, Electron paramagnetic resonance and in situ photosensitivity investigation of the photorefractive polymer BisA-NAS:DEH. in S Ducharme & PM Borsenberger (eds), Proceedings of SPIE - The International Society for Optical Engineering. Proceedings of SPIE - The International Society for Optical Engineering, vol. 2526, pp. 102-108, Xerographic Photoreceptors and Photorefractive Polymers, San Diego, CA, USA, 7/10/95.
Darwish A, Kukhtarev NV, Copland R, Sliz R, Venkateswarlu P, Caulfield HJ et al. Electron paramagnetic resonance and in situ photosensitivity investigation of the photorefractive polymer BisA-NAS:DEH. In Ducharme S, Borsenberger PM, editors, Proceedings of SPIE - The International Society for Optical Engineering. 1995. p. 102-108. (Proceedings of SPIE - The International Society for Optical Engineering).
Darwish, A. ; Kukhtarev, Nickolai V. ; Copland, R. ; Sliz, R. ; Venkateswarlu, Putcha ; Caulfield, H. John ; Ducharme, Stephen ; Takacs, James M. ; Zhang, Lei. / Electron paramagnetic resonance and in situ photosensitivity investigation of the photorefractive polymer BisA-NAS:DEH. Proceedings of SPIE - The International Society for Optical Engineering. editor / Stephen Ducharme ; Paul M. Borsenberger. 1995. pp. 102-108 (Proceedings of SPIE - The International Society for Optical Engineering).
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abstract = "We have observed the electron paramagnetic resonance (EPR) signal in the photorefractive polymer BisA-NAS:DEH. The polymer is a mixture of the electro-optic polymer bisphernol A 4,4-nitroaminostilbene (BisA-NAS) with 29{\%} by weight benzaldehyde diphenyl-hydrazone (DEH), a hole transport agent. The EPR signal was observed at 3431.590 G. Illumination of the photorefractive polymer by an Ar + laser leads to an interesting phenomenon. With an aim to understand the photosensitivity of the photorefractive polymer, we have monitored the changes in the intensity of the EPR line. The measurements were done in situ at room temperature and liquid nitrogen temperature 77 K. The sample was loaded in an optical transmission cavity to facilitate the use of the laser. When the sample is illuminating with low laser intensity, illumination decreases the EPR signal while for higher laser intensity, the EPR signal grows. We provide a tentative explanation for this phenomenon. Low laser intensity introduces photoconductivity, which reduces the EPR signal, but does not create free radicals. For higher laser intensity, paramagnetic free radicals are formed contributing to the increase of the EPR signal. The relation between observed phenomenon and photosensitivity will be discussed. Also the EPR results at low temperature will be presented.",
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