Effect of hydrofluoric acid in oxidizing acid mixtures on the hydroxylation of silicon surface

Sanjukta Guhathakurta, Anuradha Subramanian

Research output: Contribution to journalArticle

21 Citations (Scopus)

Abstract

Silicon (100) wafers, predipped in 1:20 (vv) HF water, were treated separately with four different acid mixtures, viz., HNO3, H2 SO4 - H2 O2, HNO3 -HF, and H2 SO4 - H2 O2 -HF, for different time durations. Subsequent vigorous rinsing with deionized water rendered the wafer surfaces with hydroxyl termination. Synthesized surfaces were characterized by diffuse-reflectance infrared Fourier transform spectroscopy (DRIFTS), ellipsometry, contact angle and atomic force microscopy. Surfaces treated with HNO3 and H2 SO4 - H2 O2 showed increasing hydrophilicity at room temperature due to the formation of silanol (-SiOH) terminated chemical oxides, with continuous oxide growth. An increase in hydrophilicity was observed during the first 15 min of treatment with HNO3 -HF and H2 SO4 - H2 O2 -HF acid mixtures, causing a decrease in the hydrophilic character with longer incubation times. DRIFTS analysis confirmed the addition of HF in the oxidizing acid mixture controls chemical oxide proliferation, through creating a surface with mixed -SiOH and silicon hydride (- SiHx) termination. Prolonged incubation in acidic mixtures containing HF resulted in a logarithmic increase of - SiHx coverage, rendering the surface hydrophobic. Incubation for 15 minutes in each of the four acid mixture systems generated surfaces with comparable hydrophilicity, controlled oxide growth and reduced surface roughness.

Original languageEnglish (US)
Pages (from-to)P136-P146
JournalJournal of the Electrochemical Society
Volume154
Issue number11
DOIs
StatePublished - Oct 5 2007

Fingerprint

Hydrofluoric Acid
Hydroxylation
Hydrofluoric acid
hydrofluoric acid
Silicon
Oxides
acids
Acids
Hydrophilicity
silicon
oxides
Fourier transform infrared spectroscopy
wafers
reflectance
Deionized water
Ellipsometry
Silanes
Silicon wafers
Hydroxyl Radical
water

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

Cite this

Effect of hydrofluoric acid in oxidizing acid mixtures on the hydroxylation of silicon surface. / Guhathakurta, Sanjukta; Subramanian, Anuradha.

In: Journal of the Electrochemical Society, Vol. 154, No. 11, 05.10.2007, p. P136-P146.

Research output: Contribution to journalArticle

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