Diffusion mechanism for self assembly on inhomogeneously strained surfaces

M. I. Larsson, R. F. Sabiryanov, K. Cho, B. M. Clemens

Research output: Contribution to journalConference article

Abstract

Growth of nanostructures with controlled shape, on inhomogeneously strained surfaces, is investigated by means of kinetic Monte Carlo (KMC) simulations. We propose a method to assemble self organized sub-lithographic nanostructures. The method is based on a strain-assisted mechanism for adatom surface diffusion and nucleation. For an inhomogeneous surface strain field there is normally a driving force toward the most tensile strained areas. It is shown by means of KMC simulations, that almost straight and continuous Ag nanowires can be produced on the Pt(111) surface if the growth is followed by high-temperature annealing. We suggest also how the method can be utilized as the first step of a process to reduce the circuit line width.

Original languageEnglish (US)
Pages (from-to)331-336
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume775
StatePublished - Dec 1 2003
EventSelf-Assembled Nanostructured Materials - San Francisco, CA, United States
Duration: Apr 22 2003Apr 25 2003

Fingerprint

Self assembly
self assembly
Nanostructures
Kinetics
Adatoms
Surface diffusion
kinetics
surface diffusion
Linewidth
adatoms
Nanowires
nanowires
Nucleation
simulation
nucleation
Annealing
annealing
Networks (circuits)
Temperature
Monte Carlo simulation

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Diffusion mechanism for self assembly on inhomogeneously strained surfaces. / Larsson, M. I.; Sabiryanov, R. F.; Cho, K.; Clemens, B. M.

In: Materials Research Society Symposium - Proceedings, Vol. 775, 01.12.2003, p. 331-336.

Research output: Contribution to journalConference article

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