Controllable Si (100) micro/nanostructures by chemical-etching-assisted femtosecond laser single-pulse irradiation

Xiaowei Li, Qian Xie, Lan Jiang, Weina Han, Qingsong Wang, Andong Wang, Jie Hu, Yongfeng Lu

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

In this study, silicon micro/nanostructures of controlled size and shape are fabricated by chemical-etching-assisted femtosecond laser single-pulse irradiation, which is a flexible, high-throughput method. The pulse fluence is altered to create various laser printing patterns for the etching mask, resulting in the sequential evolution of three distinct surface micro/nanostructures, namely, ring-like microstructures, flat-top pillar microstructures, and spike nanostructures. The characterized diameter of micro/nanostructures reveals that they can be flexibly tuned from the micrometer (∼2 μm) to nanometer (∼313 nm) scales by varying the laser pulse fluence in a wide range. Micro-Raman spectroscopy and transmission electron microscopy are utilized to demonstrate that the phase state changes from single-crystalline silicon (c-Si) to amorphous silicon (a-Si) after single-pulse femtosecond laser irradiation. This amorphous layer with a lower etching rate then acts as a mask in the wet etching process. Meanwhile, the on-the-fly punching technique enables the efficient fabrication of large-area patterned surfaces on the centimeter scale. This study presents a highly efficient method of controllably manufacturing silicon micro/nanostructures with different single-pulse patterns, which has promising applications in the photonic, solar cell, and sensors fields.

Original languageEnglish (US)
Article number181907
JournalApplied Physics Letters
Volume110
Issue number18
DOIs
StatePublished - May 1 2017

Fingerprint

etching
irradiation
pulses
lasers
fluence
silicon
masks
solar sensors
microstructure
spikes
printing
amorphous silicon
micrometers
manufacturing
Raman spectroscopy
solar cells
photonics
transmission electron microscopy
fabrication
rings

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Controllable Si (100) micro/nanostructures by chemical-etching-assisted femtosecond laser single-pulse irradiation. / Li, Xiaowei; Xie, Qian; Jiang, Lan; Han, Weina; Wang, Qingsong; Wang, Andong; Hu, Jie; Lu, Yongfeng.

In: Applied Physics Letters, Vol. 110, No. 18, 181907, 01.05.2017.

Research output: Contribution to journalArticle

Li, Xiaowei ; Xie, Qian ; Jiang, Lan ; Han, Weina ; Wang, Qingsong ; Wang, Andong ; Hu, Jie ; Lu, Yongfeng. / Controllable Si (100) micro/nanostructures by chemical-etching-assisted femtosecond laser single-pulse irradiation. In: Applied Physics Letters. 2017 ; Vol. 110, No. 18.
@article{b7d7acb9eab84801bdba78ddffd7616b,
title = "Controllable Si (100) micro/nanostructures by chemical-etching-assisted femtosecond laser single-pulse irradiation",
abstract = "In this study, silicon micro/nanostructures of controlled size and shape are fabricated by chemical-etching-assisted femtosecond laser single-pulse irradiation, which is a flexible, high-throughput method. The pulse fluence is altered to create various laser printing patterns for the etching mask, resulting in the sequential evolution of three distinct surface micro/nanostructures, namely, ring-like microstructures, flat-top pillar microstructures, and spike nanostructures. The characterized diameter of micro/nanostructures reveals that they can be flexibly tuned from the micrometer (∼2 μm) to nanometer (∼313 nm) scales by varying the laser pulse fluence in a wide range. Micro-Raman spectroscopy and transmission electron microscopy are utilized to demonstrate that the phase state changes from single-crystalline silicon (c-Si) to amorphous silicon (a-Si) after single-pulse femtosecond laser irradiation. This amorphous layer with a lower etching rate then acts as a mask in the wet etching process. Meanwhile, the on-the-fly punching technique enables the efficient fabrication of large-area patterned surfaces on the centimeter scale. This study presents a highly efficient method of controllably manufacturing silicon micro/nanostructures with different single-pulse patterns, which has promising applications in the photonic, solar cell, and sensors fields.",
author = "Xiaowei Li and Qian Xie and Lan Jiang and Weina Han and Qingsong Wang and Andong Wang and Jie Hu and Yongfeng Lu",
year = "2017",
month = "5",
day = "1",
doi = "10.1063/1.4982790",
language = "English (US)",
volume = "110",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "18",

}

TY - JOUR

T1 - Controllable Si (100) micro/nanostructures by chemical-etching-assisted femtosecond laser single-pulse irradiation

AU - Li, Xiaowei

AU - Xie, Qian

AU - Jiang, Lan

AU - Han, Weina

AU - Wang, Qingsong

AU - Wang, Andong

AU - Hu, Jie

AU - Lu, Yongfeng

PY - 2017/5/1

Y1 - 2017/5/1

N2 - In this study, silicon micro/nanostructures of controlled size and shape are fabricated by chemical-etching-assisted femtosecond laser single-pulse irradiation, which is a flexible, high-throughput method. The pulse fluence is altered to create various laser printing patterns for the etching mask, resulting in the sequential evolution of three distinct surface micro/nanostructures, namely, ring-like microstructures, flat-top pillar microstructures, and spike nanostructures. The characterized diameter of micro/nanostructures reveals that they can be flexibly tuned from the micrometer (∼2 μm) to nanometer (∼313 nm) scales by varying the laser pulse fluence in a wide range. Micro-Raman spectroscopy and transmission electron microscopy are utilized to demonstrate that the phase state changes from single-crystalline silicon (c-Si) to amorphous silicon (a-Si) after single-pulse femtosecond laser irradiation. This amorphous layer with a lower etching rate then acts as a mask in the wet etching process. Meanwhile, the on-the-fly punching technique enables the efficient fabrication of large-area patterned surfaces on the centimeter scale. This study presents a highly efficient method of controllably manufacturing silicon micro/nanostructures with different single-pulse patterns, which has promising applications in the photonic, solar cell, and sensors fields.

AB - In this study, silicon micro/nanostructures of controlled size and shape are fabricated by chemical-etching-assisted femtosecond laser single-pulse irradiation, which is a flexible, high-throughput method. The pulse fluence is altered to create various laser printing patterns for the etching mask, resulting in the sequential evolution of three distinct surface micro/nanostructures, namely, ring-like microstructures, flat-top pillar microstructures, and spike nanostructures. The characterized diameter of micro/nanostructures reveals that they can be flexibly tuned from the micrometer (∼2 μm) to nanometer (∼313 nm) scales by varying the laser pulse fluence in a wide range. Micro-Raman spectroscopy and transmission electron microscopy are utilized to demonstrate that the phase state changes from single-crystalline silicon (c-Si) to amorphous silicon (a-Si) after single-pulse femtosecond laser irradiation. This amorphous layer with a lower etching rate then acts as a mask in the wet etching process. Meanwhile, the on-the-fly punching technique enables the efficient fabrication of large-area patterned surfaces on the centimeter scale. This study presents a highly efficient method of controllably manufacturing silicon micro/nanostructures with different single-pulse patterns, which has promising applications in the photonic, solar cell, and sensors fields.

UR - http://www.scopus.com/inward/record.url?scp=85018978134&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85018978134&partnerID=8YFLogxK

U2 - 10.1063/1.4982790

DO - 10.1063/1.4982790

M3 - Article

AN - SCOPUS:85018978134

VL - 110

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 18

M1 - 181907

ER -