Comparison of CF4 and SF6 based plasmas for ECR etching of isotopically enriched 10boron films

L. F. Voss, C. E. Reinhardt, R. T. Graff, A. M. Conway, R. J. Nikolić, Nirmalendu Deo, Chin Li "Barry" Cheung

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Isotopically enriched 10boron films have been successfully etched in an Electron Cyclotron Resonance (ECR) etching tool using CF4 and SF6 based plasmas. Comparisons between the two are made with regard to etch rate, selectivity to the underlying Si device structure, and morphology of the 10boron post-etching. Our present film etching development is expected to be critical for the fabrication of next generation thermal neutron solid state detectors based on 10boron.

Original languageEnglish (US)
Pages (from-to)821-823
Number of pages3
JournalNuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Volume606
Issue number3
DOIs
StatePublished - Jul 21 2009

Fingerprint

Electron cyclotron resonance
electron cyclotron resonance
Etching
etching
Plasmas
thermal neutrons
Neutrons
selectivity
Detectors
solid state
Fabrication
fabrication
detectors

Keywords

  • Boron
  • Detector
  • Etch
  • Neutron
  • Plasma
  • Processing

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

Cite this

Comparison of CF4 and SF6 based plasmas for ECR etching of isotopically enriched 10boron films. / Voss, L. F.; Reinhardt, C. E.; Graff, R. T.; Conway, A. M.; Nikolić, R. J.; Deo, Nirmalendu; Cheung, Chin Li "Barry".

In: Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, Vol. 606, No. 3, 21.07.2009, p. 821-823.

Research output: Contribution to journalArticle

@article{975e0dc7ee674d63a18cf76d5a67d0e9,
title = "Comparison of CF4 and SF6 based plasmas for ECR etching of isotopically enriched 10boron films",
abstract = "Isotopically enriched 10boron films have been successfully etched in an Electron Cyclotron Resonance (ECR) etching tool using CF4 and SF6 based plasmas. Comparisons between the two are made with regard to etch rate, selectivity to the underlying Si device structure, and morphology of the 10boron post-etching. Our present film etching development is expected to be critical for the fabrication of next generation thermal neutron solid state detectors based on 10boron.",
keywords = "Boron, Detector, Etch, Neutron, Plasma, Processing",
author = "Voss, {L. F.} and Reinhardt, {C. E.} and Graff, {R. T.} and Conway, {A. M.} and Nikolić, {R. J.} and Nirmalendu Deo and Cheung, {Chin Li {"}Barry{"}}",
year = "2009",
month = "7",
day = "21",
doi = "10.1016/j.nima.2009.05.020",
language = "English (US)",
volume = "606",
pages = "821--823",
journal = "Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment",
issn = "0168-9002",
publisher = "Elsevier",
number = "3",

}

TY - JOUR

T1 - Comparison of CF4 and SF6 based plasmas for ECR etching of isotopically enriched 10boron films

AU - Voss, L. F.

AU - Reinhardt, C. E.

AU - Graff, R. T.

AU - Conway, A. M.

AU - Nikolić, R. J.

AU - Deo, Nirmalendu

AU - Cheung, Chin Li "Barry"

PY - 2009/7/21

Y1 - 2009/7/21

N2 - Isotopically enriched 10boron films have been successfully etched in an Electron Cyclotron Resonance (ECR) etching tool using CF4 and SF6 based plasmas. Comparisons between the two are made with regard to etch rate, selectivity to the underlying Si device structure, and morphology of the 10boron post-etching. Our present film etching development is expected to be critical for the fabrication of next generation thermal neutron solid state detectors based on 10boron.

AB - Isotopically enriched 10boron films have been successfully etched in an Electron Cyclotron Resonance (ECR) etching tool using CF4 and SF6 based plasmas. Comparisons between the two are made with regard to etch rate, selectivity to the underlying Si device structure, and morphology of the 10boron post-etching. Our present film etching development is expected to be critical for the fabrication of next generation thermal neutron solid state detectors based on 10boron.

KW - Boron

KW - Detector

KW - Etch

KW - Neutron

KW - Plasma

KW - Processing

UR - http://www.scopus.com/inward/record.url?scp=67649422215&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=67649422215&partnerID=8YFLogxK

U2 - 10.1016/j.nima.2009.05.020

DO - 10.1016/j.nima.2009.05.020

M3 - Article

VL - 606

SP - 821

EP - 823

JO - Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

JF - Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

SN - 0168-9002

IS - 3

ER -