Chemical vapor deposition and morphology problems

J. J. Thiart, V. Hlavacek, Hendrik J Viljoen

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

A model for chemical vapor deposition (CVD) at or near atmospheric pressure is presented. A linear stability analysis of planar growth is presented and a dispersion relation is derived that relates species transport, surface diffusion, surface tension and geometrical factors with the growth of perturbations. Severe fingering requires a description with arc-length as the independent variable. The finite element method is described to solve the evolution of the interface and of the gas-phase species concentration directly above the interface. Some examples are also given.

Original languageEnglish (US)
Pages (from-to)275-293
Number of pages19
JournalThin Solid Films
Volume365
Issue number2
DOIs
StatePublished - Apr 17 2000

Fingerprint

Chemical vapor deposition
vapor deposition
Linear stability analysis
Surface diffusion
surface diffusion
Atmospheric pressure
Surface tension
atmospheric pressure
finite element method
interfacial tension
arcs
Gases
vapor phases
Finite element method
perturbation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Chemical vapor deposition and morphology problems. / Thiart, J. J.; Hlavacek, V.; Viljoen, Hendrik J.

In: Thin Solid Films, Vol. 365, No. 2, 17.04.2000, p. 275-293.

Research output: Contribution to journalArticle

Thiart, J. J. ; Hlavacek, V. ; Viljoen, Hendrik J. / Chemical vapor deposition and morphology problems. In: Thin Solid Films. 2000 ; Vol. 365, No. 2. pp. 275-293.
@article{e6bed361e7b2489fae7de72e00db7967,
title = "Chemical vapor deposition and morphology problems",
abstract = "A model for chemical vapor deposition (CVD) at or near atmospheric pressure is presented. A linear stability analysis of planar growth is presented and a dispersion relation is derived that relates species transport, surface diffusion, surface tension and geometrical factors with the growth of perturbations. Severe fingering requires a description with arc-length as the independent variable. The finite element method is described to solve the evolution of the interface and of the gas-phase species concentration directly above the interface. Some examples are also given.",
author = "Thiart, {J. J.} and V. Hlavacek and Viljoen, {Hendrik J}",
year = "2000",
month = "4",
day = "17",
doi = "10.1016/S0040-6090(99)01053-6",
language = "English (US)",
volume = "365",
pages = "275--293",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "2",

}

TY - JOUR

T1 - Chemical vapor deposition and morphology problems

AU - Thiart, J. J.

AU - Hlavacek, V.

AU - Viljoen, Hendrik J

PY - 2000/4/17

Y1 - 2000/4/17

N2 - A model for chemical vapor deposition (CVD) at or near atmospheric pressure is presented. A linear stability analysis of planar growth is presented and a dispersion relation is derived that relates species transport, surface diffusion, surface tension and geometrical factors with the growth of perturbations. Severe fingering requires a description with arc-length as the independent variable. The finite element method is described to solve the evolution of the interface and of the gas-phase species concentration directly above the interface. Some examples are also given.

AB - A model for chemical vapor deposition (CVD) at or near atmospheric pressure is presented. A linear stability analysis of planar growth is presented and a dispersion relation is derived that relates species transport, surface diffusion, surface tension and geometrical factors with the growth of perturbations. Severe fingering requires a description with arc-length as the independent variable. The finite element method is described to solve the evolution of the interface and of the gas-phase species concentration directly above the interface. Some examples are also given.

UR - http://www.scopus.com/inward/record.url?scp=0033741136&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0033741136&partnerID=8YFLogxK

U2 - 10.1016/S0040-6090(99)01053-6

DO - 10.1016/S0040-6090(99)01053-6

M3 - Article

VL - 365

SP - 275

EP - 293

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 2

ER -